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公开(公告)号:EP0940221A3
公开(公告)日:2002-06-12
申请号:EP98305766.2
申请日:1998-07-20
发明人: Kotagiri, Fuminari , Nakamura, Yoshio , Denda, Yasuhide , Sumizawa, Haruo , Kajikura, Atsushi , Kanda, Satoki
CPC分类号: B24B37/08 , B24B41/067 , B24B47/04
摘要: The polishing machine of the present invention is capable of improving flatness of work pieces. In the polishing machine, a carrier (12) is formed into a thin plate having a through-hole (12a) in which a work piece (10) is accommodated. An upper polishing plate (14) polishes an upper face of the work piece (10). A lower polishing plate (16) pinches the work piece (10) with the upper polishing plate (14) and polishes a lower face of the work piece (10). A driving mechanism (20) moves the carrier (12) along a circular orbit in a plane without revolving. With this structure, the upper and lower faces of the work piece (10), which has been pinched between the polishing plates (14, 16), are polished by the polishing plates (14, 16).
摘要翻译: 本发明的抛光机能够改善工件的平整度。 在抛光机中,载体(12)形成为具有容纳工件(10)的通孔(12a)的薄板。 上抛光板(14)抛光工件(10)的上表面。 下抛光板(16)用上抛光板(14)夹紧工件(10)并抛光工件(10)的下表面。 驱动机构(20)使载体(12)沿平面上的圆形轨道运动而不旋转。 利用这种结构,被抛光板(14,16)夹住的工件(10)的上下表面被抛光板(14,16)抛光。
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公开(公告)号:EP0940221B1
公开(公告)日:2003-11-26
申请号:EP98305766.2
申请日:1998-07-20
发明人: Kotagiri, Fuminari , Nakamura, Yoshio , Denda, Yasuhide , Sumizawa, Haruo , Kajikura, Atsushi , Kanda, Satoki
CPC分类号: B24B37/08 , B24B41/067 , B24B47/04
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公开(公告)号:EP0940221A2
公开(公告)日:1999-09-08
申请号:EP98305766.2
申请日:1998-07-20
发明人: Kotagiri, Fuminari , Nakamura, Yoshio , Denda, Yasuhide , Sumizawa, Haruo , Kajikura, Atsushi , Kanda, Satoki
CPC分类号: B24B37/08 , B24B41/067 , B24B47/04
摘要: The polishing machine of the present invention is capable of improving flatness of work pieces. In the polishing machine, a carrier (12) is formed into a thin plate having a through-hole (12a) in which a work piece (10) is accommodated. An upper polishing plate (14) polishes an upper face of the work piece (10). A lower polishing plate (16) pinches the work piece (10) with the upper polishing plate (14) and polishes a lower face of the work piece (10). A driving mechanism (20) moves the carrier (12) along a circular orbit in a plane without revolving. With this structure, the upper and lower faces of the work piece (10), which has been pinched between the polishing plates (14, 16), are polished by the polishing plates (14, 16).
摘要翻译: 本发明的研磨机能够提高工件的平坦度。 在抛光机中,载体(12)形成为具有容纳工件(10)的通孔(12a)的薄板。 上抛光板(14)抛光工件(10)的上表面。 下抛光板(16)用上抛光板(14)夹住工件(10)并抛光工件(10)的下表面。 驱动机构(20)使载体(12)沿着圆形轨道在平面内不旋转地移动。 利用这种结构,被抛光板(14,16)之间的工件(10)的上表面和下表面被抛光板(14,16)抛光。
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