公开(公告)号：EP4011552A1

公开(公告)日：2022-06-15

申请号：EP20849840.2

申请日：2020-07-30

申请人： Fujimi Incorporated

发明人： FURUTA, Shinji ,  HAYAKAWA, Takashi ,  ASHITAKA, Keiji ,  MIWA, Naoya ,  TSUCHIYA, Kohsuke ,  TANSHO, Hisanori ,  AKIZUKI, Reiko

IPC分类号： B24B57/02 ,  C09G1/02 ,  B24B37/00 ,  H01L21/304

摘要： Provided is a method for filtering an additive-containing liquid that can achieve a polishing composition exhibiting excellent defect reducing capability while maintaining a practical filter life. The method for filtering a polishing additive-containing liquid provided by the present invention includes the step of: filtering the polishing additive-containing liquid with a filter that satisfies the following conditions (1) and (2). (1) The average pore diameter P measured by a palm porometer is 0.15 µm or less. (2) The pore diameter gradient (S in /S out ), which is the ratio of the inlet-side average pore diameter (Sin) to the outlet-side average pore diameter (S out ), both diameters being measured through observation with an SEM, is 3 or less.