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    Semiconductor device manufacturing apparatus and semiconductor device menufacturing method
    2.
    发明公开
    Semiconductor device manufacturing apparatus and semiconductor device menufacturing method 失效
    Gerätund Verfahren zur Herstellung einer Halbleitervorrichtung。

    公开(公告)号：EP0644574A1

    公开(公告)日：1995-03-22

    申请号：EP94112773.0

    申请日：1994-08-16

    申请人： HITACHI, LTD.

    发明人： Kawada,Hiroki ,  Takahashi,Kazue ,  Edamura,Manabu ,  Kanai,Saburo ,  Tamura,Naoyuki

    IPC分类号： H01J37/32

    CPC分类号： H01J37/32862 ,  H01J37/32935 ,  H01J37/32972 ,  H01J2237/022

    摘要： A semiconductor device manufacturing apparatus and its method, which measures the amount or chemical composition of reaction products adhering to or deposited on the inside of a processing chamber of the semiconductor device manufacturing apparatus, without exposing the chamber to the air. External light such as infrared light is introduced from a light introducing unit into the processing chamber by a light introducing means. A light receiving unit provided outside the processing chamber receives light reflected from a specified location inside the processing chamber or light reflected from an arbitrary location inside the chamber. The received light is then subjected to spectrometry or photometry to judge how badly the chamber is contaminated and to judge the state of the process being carried out.

    摘要翻译： 一种半导体器件制造装置及其方法，其测量粘附于或沉积在半导体器件制造装置的处理室的内部的反应产物的量或化学组成，而不将该室暴露于空气。 诸如红外光的外部光从光引入单元通过光引入装置引入处理室。 设置在处理室外部的光接收单元接收从处理室内的指定位置反射的光或从室内的任意位置反射的光。 然后接收光线进行光谱测定或光度测定，以判断室被污染的程度如何，并判断正在进行的过程的状态。