摘要:
An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要:
A polishing liquid comprising an oxidizing agent, an etching agent for an oxidized metal, an agent capable of forming a protection film, an agent for assisting the dissolution of said agent capable of forming a protection film, a method for preparing the polishing liquid and a polishing method using the liquid. Also provided are materials for a polishing liquid for a metal including an etching agent for an oxidized metal, an agent capable of forming a protection film, and an agent for assisting the dissolution of said agent capable of forming a protection film.