Patent search ap:("HITACHI HIGH TECH CORP") AND inv:"HASEGAWA NORIO" Page 1

1.

发明公开
DIFFRACTION GRATING MANUFACTURING METHOD, SPECTROPHOTOMETER, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 审中-公开
Title translation: 方法衍射仪，用于半导体器件分光光度计方法

公开(公告)号：EP2711746A4

公开(公告)日：2015-04-01

申请号：EP12785149

申请日：2012-05-17

Applicant: HITACHI HIGH TECH CORP

Inventor： EBATA YOSHISADA , MATSUI SHIGERU , HASEGAWA NORIO , KAKUTA KAZUYUKI , ONOZUKA TOSHIHIKO

IPC: G02B5/18 , G01J3/18 , G01J3/42 , G03F1/54 , G03F7/20 , H01L21/027 , H01L21/26

CPC classification number: G02B5/1857 , G01J3/0262 , G01J3/18 , G01J3/42 , G02B5/18 , G02B5/1814 , G02B5/1861 , G03F1/50 , G03F1/54 , G03F7/0005 , H01L21/26

2.

发明公开
PHASE SHIFT MASK, ASYMMETRIC PATTERN FORMING METHOD, DIFFRACTION GRATING MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD 审中-公开
Title translation: 相移掩模，方法制备不对称结构，方法衍射和方法用于半导体元件

公开(公告)号：EP2765455A4

公开(公告)日：2015-12-30

申请号：EP12837928

申请日：2012-09-13

Applicant: HITACHI HIGH TECH CORP

Inventor： KAKUTA KAZUYUKI , ONOZUKA TOSHIHIKO , MATSUI SHIGERU , EBATA YOSHISADA , HASEGAWA NORIO

IPC: G03F1/26 , G03F1/00 , G03F1/30 , H01L21/027 , H01L21/3065 , H01L21/308

CPC classification number: H01L21/3065 , G03F1/0046 , G03F1/26 , G03F1/28 , G03F1/30 , H01L21/3085

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