摘要:
Systems and methods of controlling a deposition rate during thin-film fabrication are provided. A system as provided may include a chamber, a material source contained within the chamber, an electrical component to activate the material source, a substrate holder to support the multilayer stack and at least one witness sample. The system may further include a measurement device and a computational unit. The material source provides a layer of material to the multilayer stack and to the witness sample at a deposition rate controlled at least partially by the electrical component and based on a correction value obtained in real-time by the computational unit. In some embodiments, the correction value is based on a measured value provided by the measurement device and a computed value provided by the computational unit according to a model.
摘要:
Multi-characteristic detection is achieved by altering the light incidence angle of a single Integrated Computational Element ("ICE") used in an optical computing device. The optical computing device manipulates the incidence angle of light interacting with the ICE, thereby enabling the detection of multiple sample characteristics. The effect of manipulating the light incidence angle is that the effective light path length through the ICE is altered, thus shifting the transmission spectral profile of the ICE.
摘要:
Techniques include receiving a design of an integrated computational element (ICE), the ICE design including specification of a substrate and a plurality of layers, their respective target thicknesses and complex refractive indices, complex refractive indices of adjacent layers being different from each other, and a notional ICE fabricated in accordance with the ICE design being related to a characteristic of a sample over an operational wavelength range; forming at least some of the layers of the ICE in accordance with the ICE design; optically monitoring, during the forming, optical properties of the formed layers using quasi-monochromatic probe-light having a probe wavelength that is outside of the operational wavelength range of the ICE; and adjusting the forming, at least in part, based on the optically monitored optical properties of the formed layers of the ICE.
摘要:
The disclosed embodiments include a method, apparatus, and computer program product for generating a cross-sensor standardization model. For example, one disclosed embodiment includes a system that includes at least one processor; at least one memory coupled to the at least one processor and storing instructions that when executed by the at least one processor performs operations comprising selecting a representative sensor from a group of sensors comprising at least one of same primary optical elements and similar synthetic optical responses and calibrating a cross-sensor standardization model based on a matched data pair for each sensor in the group of sensors and for the representative sensor. In one embodiment, the at least one memory coupled to the at least one processor and storing instructions that when executed by the at least one processor performs operations further comprises generating the matched data pair, wherein the matched data pair comprises calibration input data and calibration output data.
摘要:
A system and method for measuring properties of a sample utilizing a variable integrated computation element (ICE) formed of one or more layers of film that is physically sensitive to an electrical field or a magnetic field applied through the material. The thickness of a layer, and hence the optical properties of the ICE, can be electrically or magnetically altered to adjust the ICE for a analysis of a particular property of the sample, or to calibrate the ICE or to adjust the ICE to compensate for alterations to the ICE resulting from environmental conditions. The film may be formed of electrostrictive materials, piezoelectric materials, magnetorestrictive materials, and/or piezomagnetic materials.
摘要:
Technologies are described for providing optical analysis systems using an integrated computational element that has a surface patterned to selectively reflect or transmit different wavelengths by differing amounts across a spectrum of wavelengths. In one aspect, a measurement tool contains an optical element including a layer of material patterned so that the optical element selectively transmits or reflects, during operation of the measurement tool, light in at least a portion of a wavelength range by differing amounts, the differing amounts being related to a property of a sample. The wavelength range can include wavelengths in a range from about 0.2µm to about 100µm. Additionally, the sample can include wellbore fluids and the property of the sample is a property of the wellbore fluids.
摘要:
Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.
摘要:
Methods and systems for monitoring material loss in a downhole environment arising from corrosion and/or erosion include placing a downhole sensor in a borehole. The resistance of the downhole sensor is measured using a four-probe resistance technique in which a power source is provided at two electrodes of the downhole sensor and voltage is measured at two voltage taps. A rise in voltage over time indicates loss of conductive material on the downhole sensor. The conductive material on the downhole sensor may be formed to provide discrete voltage increases for improving reliability of material loss and/or rate of material loss resistance measurements.