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1.发明授权
公开(公告)号：EP1784368B1
公开(公告)日：2008-05-21
申请号：EP05777540.5
申请日：2005-08-23
发明人： MAUL, Armin , HERBERT, Thorsten , WEBER, Jürgen , LINOW, Sven , FUCHS, Stefan , SCHREIBER, Andreas , SELLNER, Reinhard
CPC分类号： C03C17/25 , C03C17/004 , C03C17/005 , C03C17/007 , C03C17/02 , C03C2217/213 , C03C2217/45 , C03C2217/475 , C03C2217/478 , C03C2218/112 , C03C2218/113 , F21V7/22 , G02B5/0242 , G02B5/0268 , G02B5/0284 , H01K1/325 , H01K1/34 , H05B3/009 , H05B2203/032 , Y02B20/125
摘要： In a previously known component comprising a reflector layer, the surface of a basic silica glass member is coated at least in part with a reflector layer. In order to create a component which is based on said component, is used particularly for producing lamps and reflectors, and is provided with an effective, chemically and thermally resistant, and inexpensive reflector layer, an SiO2 coating is provided that is made of at least partly opaque silica glass and acts as a diffuse reflector. The inventive method for producing such a component is characterized in that slurry containing amorphous SiO2 particles is produced and is applied to the surface of the basic member so as to form a layer of slurry, whereupon the layer of slurry is dried and is then glazed so as to form an SiO2 coating.
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2.发明公开BAUTEIL AUS QUARZGLAS FÜR EINE UV-STRAHLENQUELLE SOWIE VERFAHREN FÜR DIE HERSTELLUNG UND FÜR DIE EIGNUNGSDIAGNOSE EINES DERARTIGEN QUARZGLAS-BAUTEILS 审中-公开COMPONENT QUARZGLAS对于UV辐射源和方法，用于诊断，例如石英玻璃部件的生产性和适用性
公开(公告)号：EP1735250A2
公开(公告)日：2006-12-27
申请号：EP05732180.4
申请日：2005-04-05
CPC分类号： C03B19/01 , C03B19/1453 , C03B32/00 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C3/06
摘要： A conventional method for producing a quartz glass component for a UV radiation source includes melting SiO2 containing grains. The aim of the invention is to provide an improved and inexpensive method which allows for the production of a quartz glass component that is characterized by high radiation resistance. For this purpose, synthetically produced quartz crystals are smelted to give an initial product that consists of quartz glass, and contains hydroxyl groups in a number greater than the number of SiH groups. In order to remove the SiH groups, the initial product is subjected to a tempering step at a temperature of at least 850 °C, thereby obtaining the quartz glass component. The inventive quartz glass component is characterized in that the quartz glass is smelted from synthetically produced quartz crystals and has an SiH group content of less than 5 x 1017 molecules/cm3. The invention also relates to a method for testing the aptitude of a quartz glass component for the use thereof with a UV radiation source.
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3.发明公开
公开(公告)号：EP1784368A1
公开(公告)日：2007-05-16
申请号：EP05777540.5
申请日：2005-08-23
发明人： MAUL, Armin , HERBERT, Thorsten , WEBER, Jürgen , LINOW, Sven , FUCHS, Stefan , SCHREIBER, Andreas , SELLNER, Reinhard
CPC分类号： C03C17/25 , C03C17/004 , C03C17/005 , C03C17/007 , C03C17/02 , C03C2217/213 , C03C2217/45 , C03C2217/475 , C03C2217/478 , C03C2218/112 , C03C2218/113 , F21V7/22 , G02B5/0242 , G02B5/0268 , G02B5/0284 , H01K1/325 , H01K1/34 , H05B3/009 , H05B2203/032 , Y02B20/125
摘要： In a previously known component comprising a reflector layer, the surface of a basic silica glass member is coated at least in part with a reflector layer. In order to create a component which is based on said component, is used particularly for producing lamps and reflectors, and is provided with an effective, chemically and thermally resistant, and inexpensive reflector layer, an SiO2 coating is provided that is made of at least partly opaque silica glass and acts as a diffuse reflector. The inventive method for producing such a component is characterized in that slurry containing amorphous SiO2 particles is produced and is applied to the surface of the basic member so as to form a layer of slurry, whereupon the layer of slurry is dried and is then glazed so as to form an SiO2 coating.
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公开(公告)号：EP3390290A2
公开(公告)日：2018-10-24
申请号：EP16812960.9
申请日：2016-12-16
发明人： OTTER, Matthias , HÜNERMANN, Michael , NIELSEN, Nils Christian , WESSELY, Frank , SCHREIBER, Andreas , ROOS, Björn , SCHEICH, Gerrit
CPC分类号： C03B19/066 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/23 , C03C1/022 , C03C3/06 , C03C2201/11 , C03C2201/26 , C03C2201/32 , C03C2203/10 , C03C2204/04
摘要： The invention relates to a method for producing a silica glass article, involving method steps i.) providing a silica granulate made of a pyrogenically produced silica powder, ii.) forming a glass melt from the silica granulate, iii.) forming a silica glass article from at least some of the glass melt, iv.) comminuting the silica glass article so as to obtain silica glass grains, v.) processing the silica glass article to obtain a preform, and vi.) forming an opaque silica glass article from the preform. The invention further relates to an opaque silica glass article that can be obtained by said method. The invention also relates to a reactor and an arrangement, each of which can be obtained by further processing the opaque silica glass article.
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