摘要:
A process for producing a fluorinated quartz glass is described, comprising the steps of providing an SiO 2 soot body; reacting the SiO 2 soot body with a fluorinating agent having a boiling point of greater than or equal to -10°C to obtain a fluorinated SiO 2 soot body; and vitrifying the fluorinated SiO 2 soot body.
摘要:
Es sind Verfahren zur Herstellung einer Antiresonanten Hohlkernfaser bekannt, die einen sich entlang einer Faser-Längsachse erstreckenden Hohlkern und einen den Hohlkern umgebenden inneren Mantelbereich aufweist, der mehrere Antiresonanzelemente umfasst. Die bekannten Verfahren umfassen die Verfahrensschritte: des Bereitstellens eines Mantelrohres, das eine Mantelrohr-Innenbohrung und eine Mantelrohr-Längsachse aufweist, entlang der sich eine von einer Innenseite und einer Außenseite begrenzte Mantelrohr-Wandung erstreckt; des Bereitstellens einer Anzahl von rohrförmigen Antiresonanzelement-Vorformlingen; des Anordnens der Antiresonanzelement-Vorformlinge an Soll-Positionen der Innenseite der Mantelrohr-Wandung unter Bildung einer primären Vorform, die einen hohlen Kernbereich und einen inneren Mantelbereich aufweist; des Elongieren der primären Vorform zu der Hohlkernfaser oder der Weiterverarbeitung der primären Vorform zu einer sekundären Vorform. Um hiervon ausgehend eine hohe Präzision und eine exakte Positionierung der Antiresonanzelemente in einer ausreichend stabilen und reproduzierbaren Weise zu erreichen, wird vorgeschlagen, dass eine sekundäre Vorform gebildet wird, die einen Außendurchmesser im Bereich von 30 bis 90 mm aufweist, und dass mindestens eines der stirnseitigen Enden der Antiresonanzelement-Vorformlinge vor dem Faserziehen verschlossen wird.
摘要:
The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiO 2 feedstock (105), converting the vaporized SiO 2 feedstock (107) into SiO 2 particles, separating the SiO 2 particles, forming a soot body (200) and vitrifying the soot body (200). According to the invention, the vaporizing of the heated SiO 2 feedstock (105) comprises an injection phase in an expansion chamber (125), in which the SiO 2 feedstock (105) is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180°C.
摘要:
The invention relates to methods for producing a coated component consisting of quartz glass, according to which the component surface is at least partially provided with a SiO2 glass composition that differs from the quartz glass of the base body. The aim of the invention is to provide a novel way of coating a quartz glass component with a SiO2 glass composition that can be produced in a cost-effective, reproducible manner, with any thickness, and can fulfil various functions according to the concrete embodiment thereof. To this end, an amorphous slip containing SiO2 particles is produced and applied to the surface of the base body, forming a slip layer which is dried and then vitrified, forming a SiO2 glass composition. The quartz glass components coated in this way can be advantageously used especially in the production of semiconductors.
摘要:
The invention relates to a method for producing fused quartz, in which (a) a suitable liquid starter material is evaporated by it being sprayed into a vertical evaporation chamber, (b) the vaporous starter material is oxidised to form SiO 2 , and (c) the SiO 2 is collected. The method is characterised in that the starter material to be evaporated is sprayed in at the base of the evaporation chamber and the vaporous starter material is removed at the head end of the evaporation chamber, said chamber being constructed such that components separated in the chamber accumulate at the base of the evaporator and are re-sprayed. The invention also relates to an evaporator for carrying out this method.
摘要:
Known is a method for producing synthetic quartz glass comprising the following method steps: (a) reacting a carbonic silicon compound-containing raw material with oxygen in a reaction zone into SiO 2 particles, (b) precipitating the SiO2 particles on a sedimentation area by forming a porous SiO2 soot body containing hydrogen and hydroxyl groups, (c) drying the porous SiO2 soot body, and (d) glazing to the synthetic quartz glass by heating the soot body up to a glazing temperature. In order to indicate a method proceeding therefrom which facilitates a cost-efficient production of quartz glass by means of pyrolysing or hydrolysing a carbon-containing silicon compound using a carbon-containing raw material, the invention describes the production of a soot body with a carbon content within the range of 1 ppm by weight to 50 ppm by weight.
摘要:
In a known process for producing a quartz glass cylinder, a porous soot tube, which is sintered to form the quartz glass cylinder, is produced by depositing SiO 2 particles on an outer cylindrical surface of a support, which rotates about the longitudinal axis thereof and has a layer of silicon carbide (SiC layer). In order on this basis to specify a support having a high resistance to fracture, which firstly can easily be removed and which secondly presents a low risk of contamination for the soot body, the invention proposes that the SiC layer is treated at a high temperature in an oxygen-containing atmosphere before the SiO 2 particles are deposited, in such a manner that an SiO 2 protective layer having a thickness of at least 0.1 µm is produced by oxidation.
摘要:
In a known method for producing quartz glass that is doped with nitrogen, an SiO 2 base product is prepared in the form of SiO 2 grains or in the form of a porous semi-finished product produced from the SiO 2 grains and the SiO 2 base product is processed into the quartz glass with the nitrogen chemically bound therein in a hot process in an atmosphere containing a reaction gas containing nitrogen. From this starting point, a method is provided for achieving nitrogen doping in quartz glass with as high a fraction of chemically bound nitrogen as possible. This object is achieved according to the invention in that a nitrogen oxide is used as the nitrogen-containing reaction gas, and that a SiO 2 base product is used that in the hot process has a concentration of oxygen deficient defects of at least 2 x 10 15 cm -3 , wherein the SiO 2 base product comprises SiO2 particles having an average particle size in the range of 200 nm to 300 μm (D 50 value).