VERFAHREN ZUR HERSTELLUNG EINES FORMKÖRPERS AUS ELEKTROGESCHMOLZENEM SYNTHETISCHEM QUARZGLAS
    2.
    发明公开
    VERFAHREN ZUR HERSTELLUNG EINES FORMKÖRPERS AUS ELEKTROGESCHMOLZENEM SYNTHETISCHEM QUARZGLAS 有权
    VERFAHREN ZUR HERSTELLUNG EINESFORMKÖRPERSAUS ELEKTROGESCHMOLZENEM SYNTHETISCHEM QUARZGLAS

    公开(公告)号:EP2834200A1

    公开(公告)日:2015-02-11

    申请号:EP13712545.6

    申请日:2013-03-26

    IPC分类号: C03B20/00 C03B5/033 C03B19/10

    摘要: In a known method for producing a mold body from synthetic quartz glass, quartz glass granules (15) are heated in an electrically heated melt container (31) to form a softened quartz glass mass (57), and the softened quartz glass mass (57) is formed to the mold body. In order to achieve an advantageous melting behavior also in continuous melting processes, it is proposed according to the invention that synthetically produced quartz glass granules (15) of granular particles are used in which helium is enclosed, wherein said quartz glass granules (15) are produced by granulating pyrogenically produced silicic acid with the formation of a SiO
    2 granulate (9) and subsequent vitrification of the SiO
    2 granulate in a rotary kiln (1), which has a rotary tube (6) which is at least partially made of a ceramic material, and under a treatment gas that contains at least 30% by volume of helium.

    摘要翻译: 在从合成石英玻璃制造模具体的已知方法中,将石英玻璃颗粒(15)在电加热熔融容器(31)中加热以形成软化石英玻璃块(57),并将软化的石英玻璃块(57 )形成在模具体上。 为了在连续熔融过程中也实现有利的熔融行为,根据本发明提出,使用合成生产的颗粒颗粒的石英玻璃颗粒(15),其中包封氦气,其中所述石英玻璃颗粒(15)为 通过在形成SiO 2颗粒(9)中造粒热解产生的硅酸并随后在回转窑(1)中玻璃化SiO 2颗粒而制备,旋转窑(1)具有至少部分由陶瓷材料制成的旋转管(6) 并且在含有至少30体积%的氦的处理气体下。

    METHOD AND APPARATUS FOR PRODUCING A CRUCIBLE OF QUARTZ GLASS
    4.
    发明授权
    METHOD AND APPARATUS FOR PRODUCING A CRUCIBLE OF QUARTZ GLASS 有权
    方法和设备用于生产石英玻璃坩埚

    公开(公告)号:EP2300380B1

    公开(公告)日:2012-02-29

    申请号:EP09757375.2

    申请日:2009-05-06

    IPC分类号: C03B19/09

    摘要: The invention starts from a method for producing a crucible of quartz glass in that SiO
    2 inner layer granules are vitrified in a rotating melting mold (1), which is covered at least in part by a heat shield (2), in a light gas-containing atmosphere under the action of a plasma to obtain a transparent inner layer, at least part of the light gas being supplied to the melting mold (1) through a gas inlet (8,9) of the heat shield. In order to form an inner layer with a particularly low bubble content and with minimal efforts in terms of energy and material, it is proposed that in a layer-forming step preceding the vitrifying step, a granule layer (14) of the SiO
    2 inner layer granules is formed on the inner wall, and wherein the plasma zone (13) and the heat shield (2) together with the gas inlet (8,9) are movable at least in a direction perpendicular to the rotation axis and are moved laterally in the direction of the granule layer (14) during the vitrifying step so as to vitrify the granule layer (14).

    VERFAHREN ZUR HERSTELLUNG EINES BAUTEILS AUS SELTENERDMETALLDOTIERTEM QUARZGLAS

    公开(公告)号:EP3381870A1

    公开(公告)日:2018-10-03

    申请号:EP17163811.7

    申请日:2017-03-30

    IPC分类号: C03B19/06

    摘要: Bei einem bekannten Verfahren zur Herstellung eines Bauteils, das mindestens bereichsweise aus seltenerdmetalldotiertem Quarzglas besteht, wird ein Hohlräume enthaltendes Zwischenprodukts (5) aus einem mit Seltenerdmetall dotierten SiO 2 -Rohstoff in eine Sinterform eingebracht, deren Innenraum von einer kohlenstoffhaltigen Formwandung (9) begrenzt ist und darin durch Gasdrucksintern bei einer Maximal-Temperatur oberhalb von 1500 °C zu dem Bauteil erschmolzen, wobei zwischen der Formwandung (9) und dem Zwischenprodukt (5) eine Abschirmung (6 , 7, 8) angeordnet ist. Um hiervon ausgehend ein modifiziertes Gasdrucksinterverfahren anzugeben, das die Herstellung von Seltenerdmetall-dotiertem Quarzglas mit reproduzierbaren Eigenschaften gewährleistet, wird erfindungsgemäß vorgeschlagen, dass als Abschirmung eine Schüttung aus amorphen SiO 2 -Teilchen mit einer Schichtdicke von mindestens 2 mm eingesetzt wird, deren Erweichungstemperatur um mindestens 20 °C höher ist als die Erweichungstemperatur des dotierten SiO 2 -Rohstoffs, und die zu Beginn des Schmelzens des Zwischenprodukts gemäß Verfahrensschritt gasdurchlässig ist, und die beim Schmelzen zu einer für ein Druckgas gasdichten Außenschicht sintert.

    VERFAHREN ZUR HERSTELLUNG SYNTHETISCHER QUARZGLASKÖRNUNG
    8.
    发明公开
    VERFAHREN ZUR HERSTELLUNG SYNTHETISCHER QUARZGLASKÖRNUNG 有权
    方法生产合成石英玻璃砂

    公开(公告)号:EP2844618A1

    公开(公告)日:2015-03-11

    申请号:EP13718543.5

    申请日:2013-04-17

    IPC分类号: C03B19/10 F27B7/00

    摘要: The production of a quartz glass grit comprises the granulation of pyrogenetically produced silicic acid, and the formation of a SiO
    2 granulate and the vitrification of the SiO
    2 granulate using a treatment gas, which contains at least 30% by volume of helium and/or hydrogen. Said process is time consuming and cost intensive. In order to provide a method which makes it possible, starting from a porous SiO
    2 granulate, to manufacture, in a cost effective manner, a dense, synthetic quartz glass grit, which is suitable for melting bubble-free components made of quartz glass, according to the invention the vitrification of the SiO
    2 granulate occurs in a rotary kiln having a mullite-containing ceramic rotary kiln, for the manufacture of which a starting powder, which contains a molar proportion of at least 45% SiO
    2 and Al
    2 O
    3 is applied by means of a thermal powder spraying method, forming a mullite-containing layer on a mold core, and the mold core is subsequently removed, and wherein the ceramic rotary kiln is flooded with a treatment gas or rinsed with a treatment gas, and wherein the ceramic rotary kiln is flooded with a treatment gas or rinsed with a treatment gas, which contains at least 30% by volume of helium and/or hydrogen.

    VERFAHREN ZUR HERSTELLUNG SYNTHETISCHER QUARZGLASKÖRNUNG
    9.
    发明公开
    VERFAHREN ZUR HERSTELLUNG SYNTHETISCHER QUARZGLASKÖRNUNG 有权
    方法生产合成石英玻璃砂

    公开(公告)号:EP2632865A1

    公开(公告)日:2013-09-04

    申请号:EP11779622.7

    申请日:2011-10-28

    IPC分类号: C03B19/10

    摘要: The production of synthetic quartz glass granules by vitrifying a free-flowing SiO
    2 granulate from porous granulate particles is time-consuming and expensive. The aim of the invention is to provide a method that allows a continuous and cost-effective production of dense synthetic quartz glass granules on the basis of porous SiO
    2 granulate. According to the invention, this is achieved by the following method steps: (a) granulating pyrogenically produced silicic acid with the formation of the SiO
    2 granulate made of porous granulate particles; (b) drying the SiO
    2 granulate; (c) cleaning the SiO
    2 granulate by heating in an atmosphere containing halogen in a cleaning furnace; and (d) vitrifying the cleaned SiO
    2 granulate by sintering in a vitrifying furnace with the formation of quartz glass granules. The drying, cleaning, and vitrifying of the SiO
    2 granulate are each carried out in a rotary tube of a rotary tube furnace, said rotary tube rotating about a central axis. The rotary tube furnace used for vitrifying has a rotary tube, the inner wall of which consists of a ceramic material with a higher softening temperature than undoped quartz glass. Said rotary tube is flooded with a low-nitrogen treating gas or flushed with the treating gas, said gas containing at least 30 vol.% helium and/or hydrogen.

    METHOD AND APPARATUS FOR PRODUCING A CRUCIBLE OF QUARTZ GLASS
    10.
    发明公开
    METHOD AND APPARATUS FOR PRODUCING A CRUCIBLE OF QUARTZ GLASS 有权
    方法和设备用于生产石英玻璃坩埚

    公开(公告)号:EP2300380A1

    公开(公告)日:2011-03-30

    申请号:EP09757375.2

    申请日:2009-05-06

    IPC分类号: C03B19/09

    摘要: The invention starts from a method for producing a crucible of quartz glass in that SiO
    2 inner layer granules are vitrified in a rotating melting mold (1), which is covered at least in part by a heat shield (2), in a light gas-containing atmosphere under the action of a plasma to obtain a transparent inner layer, at least part of the light gas being supplied to the melting mold (1) through a gas inlet (8,9) of the heat shield. In order to form an inner layer with a particularly low bubble content and with minimal efforts in terms of energy and material, it is proposed that in a layer-forming step preceding the vitrifying step, a granule layer (14) of the SiO
    2 inner layer granules is formed on the inner wall, and wherein the plasma zone (13) and the heat shield (2) together with the gas inlet (8,9) are movable at least in a direction perpendicular to the rotation axis and are moved laterally in the direction of the granule layer (14) during the vitrifying step so as to vitrify the granule layer (14).