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14 条记录 (耗时 0.021 秒)

    Glass blank for an optical element as well as method and apparatus for heat treating the blank
    3.
    发明公开
    Glass blank for an optical element as well as method and apparatus for heat treating the blank 有权
    预制件的石英玻璃的用于微光刻设备的光学透镜使用的激光辐射，以及一个鼓和用于其制备方法

    公开(公告)号：EP1211226A2

    公开(公告)日：2002-06-05

    申请号：EP01128615.0

    申请日：2001-11-30

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Ueda, Tetsuji ,  Fujinoki, Akira ,  Nishimura, Hiroyuki ,  Trommer, Martin ,  Ochs, Stefan

    IPC分类号： C03B19/14 ,  C03B32/00

    CPC分类号： C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  Y10T428/131 ,  Y10T428/24612

    摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank.
    In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

    摘要翻译： 本发明的一个目的是提供改进的空白搜索并以高均匀性的光学部件可以从那里获得，并提供一种容器和用于热处理高度均匀的合成石英毛坯的热处理方法。 在本发明的第一方面设计的坯件的特别提供了示出一个凹形外表面。 在本发明的第二方面的特别设计的容器中用于热处理坯料被提供，从而在中心处的热辐射的程度设定为比周围高。

    Glass blank for an optical element as well as method and apparatus for heat treating the blank
    7.
    发明公开
    Glass blank for an optical element as well as method and apparatus for heat treating the blank 有权
    从玻璃母材的预成型件的热处理的光学元件和方法及装置

    公开(公告)号：EP1211226A3

    公开(公告)日：2003-02-26

    申请号：EP01128615.0

    申请日：2001-11-30

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Ueda, Tetsuji ,  Fujinoki, Akira ,  Nishimura, Hiroyuki ,  Trommer, Martin ,  Ochs, Stefan

    IPC分类号： C03B19/14 ,  C03B32/00 ,  C03C23/00

    CPC分类号： C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  Y10T428/131 ,  Y10T428/24612

    摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a method of heat-treating a highly uniform synthetic quartz glass blank. In a first aspect of the invention a special designed synthetic silica glass blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings. The ultimate use of the blank is as an optical element for use in excimer laser lithographic processes and apparatus.

    摘要翻译： 本发明的一个目的是提供改进的空白搜索并以高均匀性的光学部件可以从那里获得，并提供一种容器和用于热处理高度均匀的合成石英毛坯的热处理方法。 在本发明的第一方面设计的坯件的特别提供了示出一个凹形外表面。 在本发明的第二方面的特别设计的容器中用于热处理坯料被提供，从而在中心处的热辐射的程度设定为比周围高。

    Method for producing synthetic quartz glass members for excimer lasers and synthetic quartz glass members for excimer laser optics produced by the same
    8.
    发明公开
    Method for producing synthetic quartz glass members for excimer lasers and synthetic quartz glass members for excimer laser optics produced by the same 有权
    一种生产用于受激准分子激光的合成石英玻璃元件和过程产生的合成石英玻璃元件

    公开(公告)号：EP1233005A1

    公开(公告)日：2002-08-21

    申请号：EP02003077.1

    申请日：2002-02-13

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Nishimura, Hiroyuki ,  Yokota, Toru ,  Fujinoki, Akira

    IPC分类号： C03B19/14 ,  C03C3/06

    CPC分类号： G03F7/70958 ,  C03B19/1453 ,  C03B2201/21 ,  C03C3/06 ,  C03C2201/21 ,  C03C2203/54 ,  Y02P40/57

    摘要： In the light of the disadvantages of the prior art technology, an object of the present invention is to provide a method for producing a synthetic quartz glass member for excimer lasers, which comprises, while suppressing the generation of reductive defects which impairs the resistance against laser radiations, incorporating a sufficient amount of hydrogen molecules capable of achieving a high resistance against laser radiation into the quartz glass, yet uniformly incorporating the hydrogen molecules to realize a flat distribution in refractive indices attributed to the distribution in the density of hydrogen molecules. It is also an object of the present invention to provide a synthetic quartz glass member for excimer lasers obtained by the production method above, which yields high resistance against laser radiations and homogeneity.
    The above problems have been overcome by a method for producing a synthetic quartz glass member for excimer lasers comprising a step of incorporating hydrogen molecules into a synthetic quartz glass body by heat treating the synthetic quartz glass body at a temperature of 600 °C or lower under an atmosphere in a pressure range of 1 atm or higher but lower than 150 atm and containing hydrogen, said method comprises varying the pressure of the gas containing hydrogen either continuously or stepwise in at least a part of the heat treatment.

    摘要翻译： 在现有技术中的技术的缺点，本发明的对对象的光是提供一种用于制造用于受激准分子激光器，它包括一个合成石英玻璃部件的方法，能够抑制还原缺陷的发生这损害对激光的电阻 辐射，结合能够实现对激光辐射的高电阻到石英玻璃，但一致掺入氢分子以实现归因于氢分子的密度分布折射率的平坦分布的氢分子的足够量。 因此，就本发明目的在于提供用于通过上述的制造方法，其产生针对激光辐射和均匀性高的电阻获得的准分子激光器的合成石英玻璃部件的对象。 上述问题已经被克服通过一种用于制造用于受激准分子激光器包括将氢分子为合成石英玻璃体由热量下的600℃或更低的温度下热处理所述的合成石英玻璃主体的步骤的合成石英玻璃部件 以在1个大气压或更高的范围内的压力氢气氛，但低于150大气压，含，所述方法包括改变在至少所述热处理的一部分包含连续地氢或逐步的气体的压力。

    Synthetic quartz glass material for ArF aligners
    10.
    发明公开
    Synthetic quartz glass material for ArF aligners 审中-公开
    Synthethisches QuarzglasfürArFAusrichtgeräte

    公开(公告)号：EP1340722A1

    公开(公告)日：2003-09-03

    申请号：EP03001490.6

    申请日：2003-01-23

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

    发明人： Fujinoki, Akira ,  Nishimura, Hiroyuki ,  Uebbing, Bruno

    IPC分类号： C03B19/14 ,  C03C3/06 ,  C03C4/00

    CPC分类号： C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

    摘要： An object of the invention is to provide a synthetic quartz glass material for use in constructing optics for transmitting ArF excimer laser radiations having an energy density per pulse in a range of from 0.001 to 0.5 mJ/cm 2 , particularly suitable for use in constructing lenses, prisms, windows, and the like for semiconductor wafer aligners, which yields small change in birefringence in case laser is irradiated.
    The objects above have been accomplished by a synthetic quartz glass material for use in the optics of an ArF aligner transmitting ArF excimer laser radiations having an OH group concentration of 5 ppm or higher but not higher than 300 ppm, and a hydrogen molecule concentration of 1 × 10 16 molecules/cm 3 or higher but lower than 2 × 10 17 moleculues/cm 3 , which yields an energy density per pulse in a range of from 0.001 to 0.5 mJ/cm 2 , having a uniformity in refraction index Δn of 1 × 10 -6 or lower, a birefringence of 1 nm/cm or lower, and an internal transmittance for ultraviolet radiation 193.4 nm in wavelength of 99.7 % or higher.

    摘要翻译： 本发明的目的是提供一种合成石英玻璃材料，用于构建用于传输具有0.001至0.5mJ / cm 2范围内的每脉冲能量密度的ArF准分子激光辐射的光学器件，特别适用于 构造用于半导体晶片对准器的透镜，棱镜，窗等，其在激光被照射的情况下产生双折射的小的变化。 上述目的已经通过用于ArF对准器的光学器件中的合成石英玻璃材料来实现，该ArF对准器透射具有OH基浓度为5ppm或更高但不高于300ppm，并且氢分子浓度为1的ArF准分子激光辐射 x 10 16分子/ cm 3或更高但低于2×10 17分子/ cm 3，其产生每个脉冲的能量密度在0.001至0.5mJ / cm 2的范围内 具有1×10 -6以下的折射率DELTA n的均匀性，1nm / cm以下的双折射和99.7％以上的波长的紫外线的内部透射率为193.4nm。