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    Optical quartz glass as well as method and furnace for producing it
    2.
    发明公开
    Optical quartz glass as well as method and furnace for producing it 有权
    Optisches Quarzglas sowie Verfahren und Ofenfürseine Herstellung

    公开(公告)号：EP1321439A3

    公开(公告)日：2004-03-31

    申请号：EP02028278.6

    申请日：2002-12-17

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

    发明人： Oshima, Takayuki ,  Fujinoki, Akira

    IPC分类号： C03B32/00 ,  C03B19/14 ,  C03C3/06

    CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  Y02P40/57

    摘要： An object of the present invention is to provide a method for producing an optical synthetic quartz glass, having a birefringence of lower than 0.5 nm/cm and having favorable refractive index distribution, yet without lowering the productivity, as well as to provide an annealing furnace suitably used in practicing said method. The method is characterized in steps of raising the temperature of a columnar optical synthetic quartz glass preform (G) to a temperature of from 800°C to 1200°C, and after keeping the temperature of the synthetic quartz glass preform in said range for a definite time, lowering the temperature; the temperature is lowered with a temperature difference of from 1 to 20°C between the temperature of a light transmitting surface (E) of the optical synthetic quartz glass preform and the temperature of an outer peripheral side surface of the optical synthetic quartz glass preform with temperature-lowering rates of from 2 to 50°C/hour, respectively.

    摘要翻译： 本发明的目的是提供一种双折射率低于0.5nm / cm且具有良好的折射率分布但不降低生产率的光学合成石英玻璃的制造方法，以及提供退火炉 适用于实践所述方法。 该方法的特征在于将柱状光学合成石英玻璃预制件（G）的温度升高至800℃至1200℃的温度，并将合成石英玻璃预制件的温度保持在所述范围内 确定时间，降低温度; 在光学合成石英玻璃预制件的透光表面（E）的温度与光学合成石英玻璃预制件的外周侧表面的温度之间的温度在1至20℃之间的温度下降， 降温率分别为2〜50℃/小时。

    Quartz glass jig and method for producing the same
    3.
    发明公开
    Quartz glass jig and method for producing the same 审中-公开
    石英玻璃夹具及其制造方法

    公开(公告)号：EP1386890A2

    公开(公告)日：2004-02-04

    申请号：EP03017239.9

    申请日：2003-07-30

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

    发明人： Sato, Tatsuhiro ,  Fujinoki, Akira

    IPC分类号： C03B32/00 ,  C03B25/00 ,  C03C15/00 ,  C03C3/06 ,  C30B25/12 ,  C30B31/14

    CPC分类号： C03B32/00 ,  C03B25/00 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/30 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

    摘要： An object of the present invention is to provide a production method which is low in cost and easily and surely increases surface layer cleanliness (purity) of a quartz glass jig used in semiconductor industry, and to provide a quartz glass jig improved in surface layer cleanliness (purity).
    The above object is solved in a first embodiment of the invention comprising processing a quartz glass material through various treatments including flame treatment into a desired shape, then annealing it for strain removal, and washing it, whereby the shaped tool is heated at a high temperature falling between 800°C and 1300°C for at least 30 minutes in a clean atmosphere containing HCI gas, the heating step being after it is annealed for strain removal but before being washed. In a second alternative the step of annealing the shaped tool for strain removal is effected in a clean atmosphere containing HCL gas at a temperature falling between 800°C and 1300°C for at least 30 minutes (instead of the heat treatment step in HCL).
    A quartz glass tool for use in the field of semiconductor industry is obtained showing a total mean concentration of Li, Na, Mg, K, Ca, Fe, Cr, Ni and Cu of at most 1.0 ppm in its surface layer to a depth of at least 100 µm.

    摘要翻译： 本发明的目的在于提供一种成本低廉，容易且可靠地提高半导体工业中使用的石英玻璃夹具的表面层清洁度（纯度），并且提供表面层清洁度提高的石英玻璃夹具 （纯度）。 在本发明的第一实施例中解决了上述目的，包括通过包括火焰处理在内的各种处理将石英玻璃材料加工成期望的形状，然后对其进行退火以除去应变并对其进行清洗，从而将成形工具在高温 在含有HCl气体的清洁环境中在800℃和1300℃之间下降至少30分钟，所述加热步骤在退火之后但在清洗之前退火。 在第二种替代方案中，在含有HCL气体的清洁气氛中，在800℃至1300℃之间的温度下进行至少30分钟的退火（代替HCL中的热处理步骤） 。 获得用于半导体工业领域的石英玻璃工具，其表面层中的Li，Na，Mg，K，Ca，Fe，Cr，Ni和Cu的总平均浓度为至多1.0ppm， 至少100μm。

    Glass blank for an optical element as well as method and apparatus for heat treating the blank
    7.
    发明公开
    Glass blank for an optical element as well as method and apparatus for heat treating the blank 有权
    预制件的石英玻璃的用于微光刻设备的光学透镜使用的激光辐射，以及一个鼓和用于其制备方法

    公开(公告)号：EP1211226A2

    公开(公告)日：2002-06-05

    申请号：EP01128615.0

    申请日：2001-11-30

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co.,Ltd.

    发明人： Ueda, Tetsuji ,  Fujinoki, Akira ,  Nishimura, Hiroyuki ,  Trommer, Martin ,  Ochs, Stefan

    IPC分类号： C03B19/14 ,  C03B32/00

    CPC分类号： C03C23/007 ,  C03B19/1453 ,  C03B32/00 ,  Y10T428/131 ,  Y10T428/24612

    摘要： An object of the present invention is to provide an improved blank such that an optical member of a high homogeneity can be obtained therefrom, and to provide a vessel and a heat treatment method for heat-treating a highly uniform synthetic quartz blank.
    In a first aspect of the invention a special designed blank is provided showing a concave shaped outer surface. In a second aspect of the invention a special designed vessel for heat-treating blanks is provided, whereby the degree of heat emission at the center is set higher than that of the surroundings.

    摘要翻译： 本发明的一个目的是提供改进的空白搜索并以高均匀性的光学部件可以从那里获得，并提供一种容器和用于热处理高度均匀的合成石英毛坯的热处理方法。 在本发明的第一方面设计的坯件的特别提供了示出一个凹形外表面。 在本发明的第二方面的特别设计的容器中用于热处理坯料被提供，从而在中心处的热辐射的程度设定为比周围高。

    Synthetic quartz glass material for ArF aligners
    9.
    发明公开
    Synthetic quartz glass material for ArF aligners 审中-公开
    Synthethisches QuarzglasfürArFAusrichtgeräte

    公开(公告)号：EP1340722A1

    公开(公告)日：2003-09-03

    申请号：EP03001490.6

    申请日：2003-01-23

    申请人： Heraeus Quarzglas GmbH & Co. KG ,  Shin-Etsu Quartz Products Co., Ltd.

    发明人： Fujinoki, Akira ,  Nishimura, Hiroyuki ,  Uebbing, Bruno

    IPC分类号： C03B19/14 ,  C03C3/06 ,  C03C4/00

    CPC分类号： C03B19/1453 ,  C03B19/1469 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  Y02P40/57

    摘要： An object of the invention is to provide a synthetic quartz glass material for use in constructing optics for transmitting ArF excimer laser radiations having an energy density per pulse in a range of from 0.001 to 0.5 mJ/cm 2 , particularly suitable for use in constructing lenses, prisms, windows, and the like for semiconductor wafer aligners, which yields small change in birefringence in case laser is irradiated.
    The objects above have been accomplished by a synthetic quartz glass material for use in the optics of an ArF aligner transmitting ArF excimer laser radiations having an OH group concentration of 5 ppm or higher but not higher than 300 ppm, and a hydrogen molecule concentration of 1 × 10 16 molecules/cm 3 or higher but lower than 2 × 10 17 moleculues/cm 3 , which yields an energy density per pulse in a range of from 0.001 to 0.5 mJ/cm 2 , having a uniformity in refraction index Δn of 1 × 10 -6 or lower, a birefringence of 1 nm/cm or lower, and an internal transmittance for ultraviolet radiation 193.4 nm in wavelength of 99.7 % or higher.

    摘要翻译： 本发明的目的是提供一种合成石英玻璃材料，用于构建用于传输具有0.001至0.5mJ / cm 2范围内的每脉冲能量密度的ArF准分子激光辐射的光学器件，特别适用于 构造用于半导体晶片对准器的透镜，棱镜，窗等，其在激光被照射的情况下产生双折射的小的变化。 上述目的已经通过用于ArF对准器的光学器件中的合成石英玻璃材料来实现，该ArF对准器透射具有OH基浓度为5ppm或更高但不高于300ppm，并且氢分子浓度为1的ArF准分子激光辐射 x 10 16分子/ cm 3或更高但低于2×10 17分子/ cm 3，其产生每个脉冲的能量密度在0.001至0.5mJ / cm 2的范围内 具有1×10 -6以下的折射率DELTA n的均匀性，1nm / cm以下的双折射和99.7％以上的波长的紫外线的内部透射率为193.4nm。