公开(公告)号：EP0066883B1

公开(公告)日：1989-09-20

申请号：EP82105024.2

申请日：1982-06-08

申请人： Hitachi, Ltd. ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION

发明人： Matsuda, Tadahito ,  Okubo, Tsuneo ,  Ozasa, Susumu ,  Saitou, Norio ,  Yoda, Haruo

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：EP0066883A2

公开(公告)日：1982-12-15

申请号：EP82105024.2

申请日：1982-06-08

申请人： Hitachi, Ltd. ,  NIPPON TELEGRAPH AND TELEPHONE CORPORATION

发明人： Matsuda, Tadahito ,  Okubo, Tsuneo ,  Ozasa, Susumu ,  Saitou, Norio ,  Yoda, Haruo

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate (1) such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate (1) having thereon a number of chips (2) are divided into blocks (3), marks (4) are provided on each of the blocks (3), the positions of the marks (4) are detected and the writing exposure positions of the chips (2) within each block (3) are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.

公开(公告)号：EP0066883A3

公开(公告)日：1985-05-15

申请号：EP82105024

申请日：1982-06-08

申请人： Hitachi, Ltd. ,  Nippon Telegraph and Telephone Public Corporation

发明人： Matsuda, Tadahito ,  Okubo, Tsuneo ,  Ozasa, Susumu ,  Saitou, Norio ,  Yoda, Haruo

IPC分类号： H01L21/00

CPC分类号： H01L23/544 ,  H01J37/3045 ,  H01L21/0277 ,  H01L21/30 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： An exposure method with an electron beam exposure apparatus in which an electron beam is emitted onto a substrate (1) such as a silicon wafer on which an electron-beam sensitive resist is coated, thereby directly forming or writing patterns. A substrate (1) having thereon a number of chips (2) are divided into blocks (3), marks (4) are provided on each of the blocks (3), the positions of the marks (4) are detected and the writing exposure positions of the chips (2) within each block (3) are modified on the basis of the detection results. According to this invention, efficient writing exposure can be made with high accuracy.