专利检索 ap:("Honeywell International Inc.") AND inv:"LOWE, Marie" 第 1 页

1.

发明公开
SELECTIVE REMOVAL CHEMISTRIES FOR SEMICONDUCTOR APPLICATIONS, METHODS OF PRODUCTION AND USES THEREOF 审中-公开
标题翻译：选择性去除化学半导体应用，处理和使用

公开(公告)号：EP1991637A2

公开(公告)日：2008-11-19

申请号：EP07750366.2

申请日：2007-02-08

申请人： Honeywell International Inc.

发明人： YELLOWAGA, Deborah , PALMER, Ben , STARZYNSKI, John , MCFARLAND, John , LOWE, Marie

IPC分类号： C09K13/08

CPC分类号： C11D11/0047 , C11D3/2082 , C11D3/2086 , C11D3/245 , C11D3/30 , C11D3/43 , C11D7/08 , C11D7/265 , C11D7/28 , C11D7/3209 , C11D7/50 , C23G1/103 , G03F7/423 , G03F7/425 , G03F7/426 , H01L21/02063 , H01L21/31133 , H01L21/3121 , H01L21/3124 , H01L21/31608 , H01L21/31654 , H01L21/3185

摘要： Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H 2 O content fluorine-based constituent and at least one solvent or solvent mixture.