公开(公告)号：EP1991637A2

公开(公告)日：2008-11-19

申请号：EP07750366.2

申请日：2007-02-08

申请人： Honeywell International Inc.

发明人： YELLOWAGA, Deborah ,  PALMER, Ben ,  STARZYNSKI, John ,  MCFARLAND, John ,  LOWE, Marie

IPC分类号： C09K13/08

CPC分类号： C11D11/0047 ,  C11D3/2082 ,  C11D3/2086 ,  C11D3/245 ,  C11D3/30 ,  C11D3/43 ,  C11D7/08 ,  C11D7/265 ,  C11D7/28 ,  C11D7/3209 ,  C11D7/50 ,  C23G1/103 ,  G03F7/423 ,  G03F7/425 ,  G03F7/426 ,  H01L21/02063 ,  H01L21/31133 ,  H01L21/3121 ,  H01L21/3124 ,  H01L21/31608 ,  H01L21/31654 ,  H01L21/3185

摘要： Removal chemistry solutions and methods of production thereof are described herein that include at least one fluorine-based constituent, at least one chelating component, surfactant component, oxidizing component or combination thereof, and at least one solvent or solvent mixture. Removal chemistry solutions and methods of production thereof are also described herein that include at least one low H 2 O content fluorine-based constituent and at least one solvent or solvent mixture.

公开(公告)号：EP1828070A2

公开(公告)日：2007-09-05

申请号：EP05731200.1

申请日：2005-03-18

申请人： Honeywell International Inc.

发明人： STARZYNSKI, John

IPC分类号： C03C15/00 ,  B44C1/22 ,  C09K13/04

CPC分类号： H01L21/31111 ,  C09K13/08

摘要： Etchants for selective removal of high dielectric constant materials are described herein that comprise at least one fluorin-based constituent; water and at least one solvent or solvent mixture. Methods are also described herein for producing a wet etching chemistry solution that include providing at least one fluorine-based constituent, providing water, providing at least one solvent mixture, and combining the fluorine-based constituent and water into the least one solvent or solvent mixture to form the wet etching chemistry solution.