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公开(公告)号:EP2243155A4
公开(公告)日:2012-07-25
申请号:EP09705024
申请日:2009-01-22
Applicant: IBM
Inventor: YANG CHIH-CHAO , EDELSTEIN DANIEL C , MCFEELY FENTON R
IPC: H01L21/768 , H01L23/532
CPC classification number: H01L21/76826 , H01L21/76849 , H01L21/76883 , H01L23/53238 , H01L2924/0002 , H01L2924/00
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2.METHOD AND COMPOSITION FOR ELECTRO-CHEMICAL-MECHANICAL POLISHING 审中-公开
Title translation: 方法和组合物电化学机械抛光公开(公告)号:EP1841558A4
公开(公告)日:2012-04-04
申请号:EP05852628
申请日:2005-12-02
Applicant: IBM
Inventor: ANDRICACOS PANAYOTIS C , CANAPERI DONALD F , COOPER ENAMUEL I , COTTE JOHN M , DELIGIANNI HARIKLIA , ECONOMIKOS LAERTIS , EDELSTEIN DANIEL C , FRANZ SILVIA , PRANATHARTHIHARAN BALASUBRAMANIAN , KRISHNAN MAHADEVAIYER , MANSSON ANDREW P , WALTON ERICK G , WEST ALAN C
CPC classification number: C25F3/02 , B23H5/08 , C09G1/04 , H01L21/32125
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3.METHOD AND STRUCTURE FOR ELIMINATING ALUMINUM TERMINAL PAD MATERIAL IN SEMICONDUCTOR DEVICES 审中-公开
Title translation: 方法与结构铝连接表面材料的半导体组分去除公开(公告)号:EP2008301A4
公开(公告)日:2012-09-05
申请号:EP07760071
申请日:2007-04-04
Applicant: IBM
Inventor: EDELSTEIN DANIEL C , FAROOQ MUKTA G , HANNON ROBERT , MELVILLE IAN D
CPC classification number: H01L24/03 , H01L23/3192 , H01L24/05 , H01L24/11 , H01L2224/03019 , H01L2224/039 , H01L2224/0401 , H01L2224/05018 , H01L2224/05083 , H01L2224/05166 , H01L2224/05171 , H01L2224/05181 , H01L2224/05558 , H01L2224/05572 , H01L2224/05647 , H01L2224/1146 , H01L2224/13022 , H01L2224/13116 , H01L2924/00014 , H01L2924/0002 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01029 , H01L2924/01033 , H01L2924/0105 , H01L2924/01073 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/04953 , H01L2924/05042 , H01L2924/14 , H01L2924/01074 , H01L2924/00011 , H01L2924/00015 , H01L2924/01039 , H01L2224/05552
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