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1.
公开(公告)号:EP2522032A4
公开(公告)日:2014-05-28
申请号:EP11732064
申请日:2011-01-05
Applicant: IBM
Inventor: CHANG JOSEPHINE B , CHANG LELAND , LIN CHUNG-HSUN , SLEIGHT JEFFREY W
IPC: H01L29/786 , H01L21/265 , H01L21/336 , H01L29/66
CPC classification number: H01L21/26586 , H01L29/1083 , H01L29/42384 , H01L29/66659 , H01L29/66772 , H01L29/78615
Abstract: In one exemplary embodiment of the invention, an asymmetric N-type field effect transistor includes: a source region coupled to a drain region via a channel; a gate structure overlying at least a portion of the channel; a halo implant disposed at least partially in the channel, where the halo implant is disposed closer to the source region than the drain region; and a body-tie coupled to the channel. In a further exemplary embodiment, the asymmetric N-type field effect transistor is operable to act as a symmetric N-type field effect transistor.
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2.
公开(公告)号:EP2545586A4
公开(公告)日:2016-03-30
申请号:EP11753755
申请日:2011-02-04
Applicant: IBM
Inventor: GUO DECHAO , HEN SHU-JEN , LIN CHUNG-HSUN , SU NING
CPC classification number: H01L27/0688 , H01L29/1606 , Y10S977/755
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