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1.发明公开FORMATION OF METAL-INSULATOR METAL CAPACITOR SIMULTANEOUSLY WITH ALUMINUM METAL WIRING LEVEL USING A HARDMASK 审中-公开同时地形成金属 - 绝缘体 - 金属电容器与铝金属布线LEVEL使用硬掩模
公开(公告)号：EP1792343A4
公开(公告)日：2009-11-11
申请号：EP05754954
申请日：2005-05-26
Applicant: IBM
Inventor： COOLBAUGH DOUGLAS D , ESHUN EBENEZER E , FEILCHENFELD NATALIE , GAUTSCH MICHAEL L , HE ZHONG-XIANG , MOON MATTHEW D , RAMACHANDRAN VIDHYA , WATERHOUSE BARBARA
IPC: H01L21/8242 , H01L21/02 , H01L21/20 , H01L23/522 , H01L27/01 , H01L27/08
CPC classification number: H01L23/5223 , H01L27/016 , H01L27/0805 , H01L28/40 , H01L2924/0002 , Y10T29/49002 , H01L2924/00
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