公开(公告)号：EP1450153A4

公开(公告)日：2009-03-18

申请号：EP02783676

申请日：2002-11-28

Applicant: IBM

Inventor： UDA MITSURU ,  TERAKAWA KAZUNARI ,  SUZUKI AKIRA ,  MORITA CHIAKI ,  YAMADA YASUHARU ,  HAYAND TERUHIKO

IPC: G01N21/956 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

CPC classification number: G03F7/70616 ,  G01N21/956 ,  G03F7/70641

Abstract: The profile error (deviation) of a pattern having an uneven section is detected simply and highly accurately. A pattern (32) inspection device for detecting the profile error of a pattern having an uneven section, comprising a plate (30) to mount a pattern thereon, light sources (40, 42, 44) capable of changing angles of light beams applied to the pattern within a range of 15 to 75 degrees with respect to the top surface of the pattern, and light receivers (52, 54) capable of receiving light beams reflected from the pattern at angles within a range of 15 to 75 degrees, characterized in that the profile error of the pattern is detected from quantities of reflected light from edges between the top surfaces and the side surfaces of respective portions of the pattern.