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公开(公告)号：EP2271730A1
公开(公告)日：2011-01-12
申请号：EP09738294.9
申请日：2009-03-27
IPC分类号： C10G25/00 , C10G35/04 , C10G45/10 , C10G45/04 , C10G69/08 , B01D15/00 , B01D53/68 , B01D53/02 , B01J20/04 , B01J20/08
CPC分类号： C10G45/04 , B01D53/04 , B01D53/75 , B01D53/8662 , B01D2253/104 , B01D2255/1021 , B01D2255/1023 , B01D2255/202 , B01D2255/204 , B01D2257/2045 , B01D2257/2064 , C10G25/003 , C10G35/04 , C10G45/10 , C10G69/08 , C10G2300/201
摘要： The invention concerns a process for purification by elimination of chlorine in the form of hydrogen chloride and organochlorine compounds by contacting in the presence of hydrogen of at least a part of the effluent from a reforming, aromatics production, dehydrogenation, isomerisation or hydrogenation zone, said part of the effluent comprising olefins, hydrogen chloride and organochlorine compounds, on an elimination zone comprising a chain arrangement of two masses, the first mass being a mass comprising at least one metal from group VIII deposited on a mineral carrier and the second mass being a hydrogen chloride adsorbent.
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公开(公告)号：EP2175985B1
公开(公告)日：2019-05-08
申请号：EP08826442.9
申请日：2008-06-18
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3.发明授权
公开(公告)号：EP2385874B1
公开(公告)日：2013-02-20
申请号：EP09793562.1
申请日：2009-12-03
发明人： CHICHE, David , BOUDET, Nicolas , VIGUIE, Jean-Christophe , LELIAS, Marc-Antoine , DUCREUX, Olivier
CPC分类号： B01D53/685 , B01D53/52 , B01D53/75 , B01D53/8606 , B01D53/8621 , B01D2253/112 , B01D2255/20707 , B01D2256/16 , B01D2256/20 , B01D2257/2042 , B01D2257/2045 , B01D2257/2047 , B01D2257/304 , B01D2257/308 , B01D2257/406 , B01D2257/408 , C10K1/101 , C10K1/16 , C10K1/32 , C10K1/34
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公开(公告)号：EP3174631B1
公开(公告)日：2019-08-07
申请号：EP15732582.0
申请日：2015-06-22
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公开(公告)号：EP2271730B1
公开(公告)日：2012-06-06
申请号：EP09738294.9
申请日：2009-03-27
IPC分类号： B01D53/04 , B01D53/75 , B01D53/86 , C10G25/00 , B01D15/00 , B01D53/02 , B01J20/04 , B01J20/08 , B01D53/68 , C10G35/04 , C10G45/04 , C10G45/10 , C10G69/08
CPC分类号： C10G45/04 , B01D53/04 , B01D53/75 , B01D53/8662 , B01D2253/104 , B01D2255/1021 , B01D2255/1023 , B01D2255/202 , B01D2255/204 , B01D2257/2045 , B01D2257/2064 , C10G25/003 , C10G35/04 , C10G45/10 , C10G69/08 , C10G2300/201
摘要： The invention concerns a process for purification by elimination of chlorine in the form of hydrogen chloride and organochlorine compounds by contacting in the presence of hydrogen of at least a part of the effluent from a reforming, aromatics production, dehydrogenation, isomerisation or hydrogenation zone, said part of the effluent comprising olefins, hydrogen chloride and organochlorine compounds, on an elimination zone comprising a chain arrangement of two masses, the first mass being a mass comprising at least one metal from group VIII deposited on a mineral carrier and the second mass being a hydrogen chloride adsorbent.
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6.发明公开
公开(公告)号：EP2385874A1
公开(公告)日：2011-11-16
申请号：EP09793562.1
申请日：2009-12-03
发明人： CHICHE, David , BOUDET, Nicolas , VIGUIE, Jean-Christophe , LELIAS, Marc-Antoine , DUCREUX, Olivier
CPC分类号： B01D53/685 , B01D53/52 , B01D53/75 , B01D53/8606 , B01D53/8621 , B01D2253/112 , B01D2255/20707 , B01D2256/16 , B01D2256/20 , B01D2257/2042 , B01D2257/2045 , B01D2257/2047 , B01D2257/304 , B01D2257/308 , B01D2257/406 , B01D2257/408 , C10K1/101 , C10K1/16 , C10K1/32 , C10K1/34
摘要： The invention relates to a method for the ultimate removal of sulphur, nitrogen and halogen impurities from a synthetic gas, wherein said method includes: a) the combined step of hydrolysing COS and HCN contained in the gas and trapping the halogen compounds using a TiO
2 catalyst; b) the step of scrubbing using a solvent; a step of desulphurization on a trapping mass or adsorbent. The synthetic gas purified according to the method of the invention contains less than 10 wt ppb of sulphur-containing impurities, less than 10 wt ppb of nitrogen impurities, and less than 10 wt ppb of halogen impurities.
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