专利检索 ap:("IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)") AND inv:"LEE, Jae Hyuk" 第 1 页

1.

发明公开
MULTI-LAYERED MOLECULAR FILM PHOTORESIST HAVING MOLECULAR LINE STRUCTURE AND METHOD FOR MANUFACTURING SAME 审中-实审

公开(公告)号：EP4386482A1

公开(公告)日：2024-06-19

申请号：EP22856301.1

申请日：2022-08-12

申请人： IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY)

发明人： SUNG, Myung Mo , AHN, Jinho , BAK, Yeong Eun , JI, Hyeon Seok , LEE, Jae Hyuk

IPC分类号： G03F7/09 , G03F7/004 , G03F7/16 , G03F7/11

CPC分类号： G03F7/09 , G03F7/16 , G03F7/11 , G03F7/004

摘要： A multilayer molecular film photoresist is provided. The multilayer molecular film photoresist comprises a plurality of molecular lines extending upwards above a substrate arranged in the horizontal direction. Each of the molecular lines includes a plurality of inorganic single molecules and an organic single molecule sandwiched between at least some of the inorganic single molecules, and these single molecules are connected by bonds.