METHOD AND SYSTEM FOR MODIFYING A SUBSTRATE USING A PLASMA
    2.
    发明公开
    METHOD AND SYSTEM FOR MODIFYING A SUBSTRATE USING A PLASMA 审中-公开
    方法和系统进行修改的基板利用等离子体

    公开(公告)号:EP3017457A1

    公开(公告)日:2016-05-11

    申请号:EP14739098.3

    申请日:2014-07-03

    摘要: A method and system of modifying a substrate (8) using a plasma are described comprising providing a first electrode (4) and a second electrode (6); arranging the substrate such that a portion of the substrate is between the electrodes; supplying a voltage to at least one of the electrodes so as to create a plasma discharge between the electrodes which contacts at least said portion of the substrate, moving either the substrate and/or said second electrode such that said substrate and said second electrode are being linearly displaced relative to each other along an axis (80) of linear displacement during said movement; and wherein said second electrode is arranged relative to said axis of linear displacement such that said linear movement causes a first section of the portion of substrate to have a greater residence time between the electrodes during said linear displacement than a second section of said portion of the substrate. A method and system of modifying a substrate (8) using a plasma is also described comprising providing a first electrode (4) and a second electrode (6); arranging the substrate such that a portion of the substrate is between the electrodes; supplying a voltage to at least one of the electrodes so as to create a plasma discharge between the electrodes which contacts at least said portion of the substrate, moving either the substrate and/or said second electrode such that said substrate and said second electrode are being linearly displaced relative to each other along an axis (80) of linear displacement during said movement; and further comprising the step of rotating either the substrate or said second electrode about an axis of rotation during said relative linear displacement along said axis (80), so that a first section of the portion of substrate has a greater residence time between the electrodes than a second section of said portion of substrate.