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1.发明公开METHOD AND APPARATUS FOR MEASUREMENT AND CONTROL OF PHOTOMASK TO SUBSTRATE ALIGNMENT 有权方法在基底上测量和控制光掩模基板对准衍射镜安排的形成
公开(公告)号：EP2206020A2
公开(公告)日：2010-07-14
申请号：EP08803847.6
申请日：2008-09-08
发明人： GRANADOS, Axel, Aguado , FOX, Benjamin, Aaron , GIBBS, Nathaniel, James , MAKI, Andrew, Benson , TIMPANE, Trevor, Joseph
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/708 , G03F9/7084 , G03F9/7088 , G03F9/7096 , Y10S438/975
摘要： A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
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2.发明授权
公开(公告)号：EP2206020B1
公开(公告)日：2013-08-14
申请号：EP08803847.6
申请日：2008-09-08
发明人： GRANADOS, Axel, Aguado , FOX, Benjamin, Aaron , GIBBS, Nathaniel, James , MAKI, Andrew, Benson , TIMPANE, Trevor, Joseph
IPC分类号： G03F9/00
CPC分类号： G03F9/7049 , G03F9/7003 , G03F9/7076 , G03F9/708 , G03F9/7084 , G03F9/7088 , G03F9/7096 , Y10S438/975
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