利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

3 条记录 (耗时 0.009 秒)

    System for generating uniform gas flow in a plasma reactor chamber
    2.
    发明公开
    System for generating uniform gas flow in a plasma reactor chamber 失效
    Einrichtung zur Erzeugung einer均质Gasströmung在einer Plasma-Kammer。

    公开(公告)号：EP0188207A2

    公开(公告)日：1986-07-23

    申请号：EP86100108.9

    申请日：1986-01-07

    申请人： International Business Machines Corporation

    发明人： Lo, John Choung-lin ,  Lu, Neng-hsing

    IPC分类号： H01J37/32 ,  C23C14/34 ,  H05H1/46 ,  C23C16/50

    CPC分类号： H01J37/32165 ,  H01J37/3244 ,  H05K3/0055 ,  H05K2203/095

    摘要： @ In the system, a hollow electrode (70) having two major surfaces and a plurality of apertures (72) in both major surfaces is disposed in the chamber. Connected to this hollow electrode is a radio frequency power source (76) for generating an electrical field. A second hollow electrode (78) also having two major surfaces with a plurality of apertures in both surfaces is disposed opposite the first electrode (70). A second radio frequency power source (80) is connected to the second electrode. A substrate (74) is placed in the chamber between the first and second electrodes. Provision (94,96,98,100;106) is made for introducing a gas to be converted in a reactive species by the radio frequency electrical field so that gas is uniformly distributed across the substrate.

    摘要翻译： 在该系统中，具有两个主表面的中空电极（70）和两个主表面中的多个孔（72）设置在腔室中。 连接到该中空电极的是用于产生电场的射频电源（76）。 在第一电极（70）相对的第二空心电极（78）中，两个主表面在两个表面上具有多个孔。 第二射频电源（80）连接到第二电极。 将衬底（74）放置在第一和第二电极之间的腔室中。 设置（94,96,98,100,66）用于通过射频电场引入要转化为反应物种的气体，使得气体均匀地分布在基板上。

    System for generating uniform gas flow in a plasma reactor chamber
    3.
    发明公开
    System for generating uniform gas flow in a plasma reactor chamber 失效
    在等离子体反应器室中产生均匀气体流的系统

    公开(公告)号：EP0188207A3

    公开(公告)日：1987-09-30

    申请号：EP86100108

    申请日：1986-01-07

    申请人： International Business Machines Corporation

    发明人： Lo, John Choung-lin ,  Lu, Neng-hsing

    IPC分类号： H01J37/32 ,  C23C14/34 ,  H05H01/46 ,  C23C16/50

    CPC分类号： H01J37/32165 ,  H01J37/3244 ,  H05K3/0055 ,  H05K2203/095

    摘要： @ In the system, a hollow electrode (70) having two major surfaces and a plurality of apertures (72) in both major surfaces is disposed in the chamber. Connected to this hollow electrode is a radio frequency power source (76) for generating an electrical field. A second hollow electrode (78) also having two major surfaces with a plurality of apertures in both surfaces is disposed opposite the first electrode (70). A second radio frequency power source (80) is connected to the second electrode. A substrate (74) is placed in the chamber between the first and second electrodes. Provision (94,96,98,100;106) is made for introducing a gas to be converted in a reactive species by the radio frequency electrical field so that gas is uniformly distributed across the substrate.