公开(公告)号：EP2044404A4

公开(公告)日：2012-10-24

申请号：EP06786916

申请日：2006-07-11

Applicant: J A WOOLLAM CO INC

Inventor： JOHS BLAINE D ,  HERZINGER CRAIG M ,  GREEN STEVEN E ,  HALE JEFFREY S

IPC: G01N21/21

CPC classification number: G01N21/211 ,  G01N21/274 ,  G01N2021/213

公开(公告)号：EP1038165A4

公开(公告)日：2000-10-25

申请号：EP98907397

申请日：1998-02-02

Applicant: J A WOOLLAM CO INC

Inventor： JOHS BLAINE D ,  THOMPSON DANIEL W

IPC: G01J3/28 ,  G01J3/447 ,  G01J4/00 ,  G01N21/21

CPC classification number: G01N21/211 ,  G01J3/447 ,  G01J4/00 ,  G01J2003/2866

Abstract: A spectroscopic rotating compensator material system investigation system including a photo array (DE's) for simultaneously detecting a multiplicity of wavelengths is disclosed. The spectroscopic rotating compensator material system investigation system is calibrated by a mathematical regression based technique involving, where desirable, parameterization of calibration parameters. Calibration is possible of calibration parameters. Calibration is possible utilizing a single two-dimensional data set obtained with the spectroscopic rotating compensator material system investigation system in a "material system present" or in a "straight-through" configuration.

Abstract translation: 公开了一种包括用于同时检测多个波长的光阵列（DE）的光谱旋转补偿器材料系统调查系统。 光谱旋转补偿器材料系统调查系统通过基于数学回归的技术进行校准，该技术涉及在需要时对校准参数进行参数化。 校准是可能的校准参数。 使用通过光谱旋转补偿器材料系统调查系统在“材料系统存在”或“直通”配置中获得的单个二维数据集进行校准是可能的。

公开(公告)号：EP0814505A1

公开(公告)日：1997-12-29

申请号：EP96304556

申请日：1996-06-19

Applicant: J A WOOLLAM CO INC

Inventor： WOOLLAM JOHN A ,  JOHS BLAINE D ,  CHOW PETER P

IPC: C30B23/02 ,  H01L21/20 ,  H01L21/66

CPC classification number: B24B37/013 ,  C30B23/002 ,  H01L22/26

Abstract: A method of, and system for, applying light beam producing systems (7) such as ellipsometers, polarimeters, polarized light reflectance and functionally similar systems, such that a beam of light produced thereby is caused to be incident upon a process element (4) at an angle in excess of an associated Brewster angle while enabling the production of a signal sufficiently sensitive to changes in process element parameters, for use in "real-time" process element process monitoring and control, is disclosed. In addition a process element processing system (1) and electron beam producing system and light beam producing system combination system is taught, wherein the electron beam producing (2) and light beam producing (7) systems are mounted to the process element processing system (1), (typically a (MBE) system), by input and output interface systems (9I) (9O) present at a location appropriate for conventional Reflection High Energy Electron Diffraction (RHEED) systems.

Abstract translation: 一种用于应用诸如椭偏仪，偏振计，偏振光反射率和功能相似系统的光束产生系统（7）的方法和系统，使得由此产生的光束被入射到处理元件（4）上， 公开了在“实时”过程元件过程监视和控制中使用的超过相关布鲁斯特角度的角度，同时能够产生对过程元件参数的变化足够敏感的信号。 此外，教导了处理元件处理系统（1）和电子束产生系统和光束产生系统组合系统，其中将电子束产生（2）和光束产生（7）系统安装到处理元件处理系统 1），（通常为（MBE）系统），通过输入和输出接口系统（9I）（90）存在于适合于常规反射高能电子衍射（RHEED）系统的位置。