公开(公告)号：EP1640342A4

公开(公告)日：2006-11-22

申请号：EP04746061

申请日：2004-06-11

申请人： JSR CORP

发明人： IWASAWA HARUO ,  WANG DAOHAI ,  MATSUKI YASUO ,  KATO HITOSHI

IPC分类号： C01B33/04 ,  C01B33/02 ,  C01B33/021 ,  C01B33/08 ,  C08G77/60 ,  C08L83/16 ,  C09D4/00 ,  C09D183/16 ,  C23C18/08 ,  C23C18/14 ,  H01L21/208

CPC分类号： C09D183/16 ,  C01B33/08 ,  C09D4/00 ,  H01L21/02422 ,  H01L21/02425 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/02628 ,  C08G77/00

摘要： A silane polymer is disclosed which has a larger molecular weight in view of boiling point, safety, and wetting property in case when it is applied to a substrate. In particular, a composition is disclosed which enables to form a good silicon film easily. A composition for forming a silicon film is disclosed which contains a silane polymer obtained by irradiating a photopolymerizable silane compound with light in a specific wavelength range for causing photopolymerization thereof. A method for forming a silicon film is also disclosed wherein such a composition is applied to a substrate and then subjected to heat treatment and/or photo treatment.