公开(公告)号：EP1602975A4

公开(公告)日：2009-12-02

申请号：EP03789633

申请日：2003-12-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  FUJIWARA KOUICHI ,  KOBAYASHI EIICHI ,  SHIMOKAWA TSUTOMU ,  NAKAMURA ATSUSHI ,  YONEDA EIJI ,  WANG YONG

IPC: C08F4/00 ,  G03F7/004 ,  G03F7/039

CPC classification number: G03F7/039 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2006

公开(公告)号：EP1897869A4

公开(公告)日：2010-05-05

申请号：EP06746255

申请日：2006-05-11

Applicant: JSR CORP

Inventor： NAGAI TOMOKI ,  SHIMOKAWA TSUTOMU ,  SUGIURA MAKOTO ,  KAWAKAMI TAKANORI ,  EBATA TAKUMA ,  YONEDA EIJI ,  SHIMIZU MAKOTO

IPC: C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/02 ,  C08F220/12 ,  C08L33/04 ,  C08L41/00 ,  G03F7/039 ,  H01L21/027

CPC classification number: C09D133/14 ,  C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/00 ,  C08F28/02 ,  C08F214/18 ,  C08F220/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F228/02 ,  C09D141/00 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397

公开(公告)号：EP1757628A4

公开(公告)日：2008-04-30

申请号：EP05737180

申请日：2005-05-02

Applicant: JSR CORP

Inventor： NAKASHIMA HIROMITSU ,  UTAKA TOMOHIRO ,  CHIBA TAKASHI ,  YONEDA EIJI ,  NAKAMURA ATSUSHI

IPC: C08F220/28 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition that not only excels in fundamental properties as resist, such as sensitivity and resolution, but also with respect to both of line-and-space pattern and isolated space pattern, realizes extensive depth of focus (DOF) and is less in the line width change attributed to alteration of baking temperature, the limit line width free from any phenomenon of line pattern collapse of the radiation-sensitive resin composition being small. Further, there is provided a lactone copolymer being useful as a resin component of the radiation-sensitive resin composition. This lactone copolymer is represented by a copolymer of compound of the following formula (1-1), compound of the following formula (2-1) and compound of the following formula (3-1). This radiation-sensitive resin composition comprises the lactone copolymer (a) and radiation-sensitive acid generating agent (b).