公开(公告)号：EP1708027A4

公开(公告)日：2008-12-03

申请号：EP05703585

申请日：2005-01-14

Applicant: JSR CORP

Inventor： KIMURA TORU ,  NISHIMURA YUKIO ,  UTAKA TOMOHIRO ,  NEMOTO HIROAKI ,  NAKAMURA ATSUSHI ,  CHIBA TAKASHI ,  NAKAGAWA HIROKI

IPC: G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ±-position.

公开(公告)号：EP1806370A4

公开(公告)日：2008-07-23

申请号：EP05787854

申请日：2005-09-28

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  KIMURA TORU ,  UTAKA TOMOHIRO ,  NAKAGAWA HIROKI ,  SAKAKIBARA HIROKAZU ,  DOUGAUCHI HIROSHI

IPC: C08F220/10 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

Abstract: Disclosed is an upper film-forming composition which enables to form a coating film on a photoresist without causing intermixing with the photoresist film and to maintain a stable coating film without dissolving into a medium used during immersion exposure. The upper film-forming composition is also capable to form an upper layer which enables to obtain a pattern shape that is not inferior to the one obtained by a process other than immersion exposure, namely a dry exposure and can be easily dissolved in an alkaline developer. Also disclosed is a copolymer containing a repeating unit having a group represented by the general formula (1) below, a repeating unit having a group represented by the general formula (2) below, at least one repeating unit (I) selected from repeating units having a carboxyl group, and a repeating unit (II) having a sulfo group, and having a weight average molecular weight of 2,000-100,000 determined by gel permeation chromatography. (1) (2) At least one of R

公开(公告)号：EP1757990A4

公开(公告)日：2011-04-27

申请号：EP05743737

申请日：2005-05-24

Applicant: JSR CORP

Inventor： SAKAKIBARA HIROKAZU ,  ABE TAKAYOSHI ,  CHIBA TAKASHI ,  KIMURA TORU

IPC: G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  H01L21/0274

公开(公告)号：EP1736829A4

公开(公告)日：2011-01-05

申请号：EP05730408

申请日：2005-04-13

Applicant: JSR CORP

Inventor： NISHIMURA I ,  CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU

IPC: G03F7/075 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0757

公开(公告)号：EP1757628A4

公开(公告)日：2008-04-30

申请号：EP05737180

申请日：2005-05-02

Applicant: JSR CORP

Inventor： NAKASHIMA HIROMITSU ,  UTAKA TOMOHIRO ,  CHIBA TAKASHI ,  YONEDA EIJI ,  NAKAMURA ATSUSHI

IPC: C08F220/28 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  H01L21/027

CPC classification number: C08F220/28 ,  C08F220/18 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A radiation-sensitive resin composition that not only excels in fundamental properties as resist, such as sensitivity and resolution, but also with respect to both of line-and-space pattern and isolated space pattern, realizes extensive depth of focus (DOF) and is less in the line width change attributed to alteration of baking temperature, the limit line width free from any phenomenon of line pattern collapse of the radiation-sensitive resin composition being small. Further, there is provided a lactone copolymer being useful as a resin component of the radiation-sensitive resin composition. This lactone copolymer is represented by a copolymer of compound of the following formula (1-1), compound of the following formula (2-1) and compound of the following formula (3-1). This radiation-sensitive resin composition comprises the lactone copolymer (a) and radiation-sensitive acid generating agent (b).