公开(公告)号：EP1331518A2

公开(公告)日：2003-07-30

申请号：EP03001530.9

申请日：2003-01-23

申请人： JSR Corporation

发明人： Shiraki, Shinji ,  Suzuki, Masayoshi ,  Sasaki, Hirofumi ,  Niwa, Kazuaki ,  Nishikawa, Michinori

IPC分类号： G03F7/075

CPC分类号： G03F7/0757 ,  G03F7/0007 ,  G03F7/0045

摘要： There is disclosed a radiation sensitive composition containing a silane compound represented by the following formula (1):

        (R 1 ) p Si(X) 4-p      (I)

wherein R 1 is an unhydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3,
a hydrolyzate thereof and a condensate of the hydrolyzate; and a compound which generates an acid or base upon exposure to radiation. The composition is used to form an insulating film for an organic EL display device, and an interlayer insulating film for a liquid crystal display device.

摘要翻译： 有圆盘游离缺失包含由下式表示的硅烷化合物的辐射敏感性组合物（1）：（R <1>）p的Si（X）4-P worin - [R <1>是具有1至12个碳原子的unhydrolyzable有机基团， X为可水解基团，和p是0〜3的整数，其水解物和该水解物的缩合物; 和其在暴露于辐射的基因的酸或碱的速率的化合物。 该组合物被用于形成对上有机EL显示装置的绝缘膜，并在层间绝缘膜的液晶显示装置。

公开(公告)号：EP1892574A1

公开(公告)日：2008-02-27

申请号：EP07114097.4

申请日：2007-08-09

申请人： JSR Corporation

发明人： Ito, Atsushi ,  Goto, Hirofumi ,  Sasaki, Hirofumi ,  Okuda, Ryuichi

IPC分类号： G03F7/038 ,  G03F7/004

CPC分类号： G03F7/0382 ,  G03F7/0045

摘要： The objective of the present invention is to provide a photosensitive insulating resin composition which is highly sensitive to g-line and h-line and enables to form a surface-protecting film, an interlayer insulation film and a planarized film that are excellent in various properties including resolution, electrical insulation property and thermal shock resistance, a cured product and an electronic component having the cured product. The present photosensitive insulating resin composition comprises an alkalisoluble resin having a phenolic hydroxyl group, a radiation sensitive acid generator comprising an s-triazine derivative represented by the following general formula (1), and a crosslinking agent.

[In the formula (1), R is hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxyl group having 1 to 4 carbon atoms, X is a halogen atom and Y is oxygen atom or sulfur atom.]

摘要翻译： 本发明的目的是提供对g线和h线高度敏感的感光性绝缘树脂组合物，能够形成各种性能优异的表面保护膜，层间绝缘膜和平坦化膜 包括分辨率，电绝缘性和耐热冲击性，固化产物和具有固化产物的电子部件。 本发明的感光性绝缘性树脂组合物含有具有酚性羟基的可溶性树脂，含有下述通式（1）表示的s-三嗪衍生物的辐射敏感性酸产生剂和交联剂。 [式（1）中，R为氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，X为卤素原子，Y为氧原子或硫原子。

公开(公告)号：EP1755365A1

公开(公告)日：2007-02-21

申请号：EP06119171.4

申请日：2006-08-18

申请人： JSR Corporation

发明人： Sasaki, Hirofumi ,  Ito, Atsushi ,  Goto, Hirofumi ,  Hashiguchi, Yuichi

IPC分类号： H05K1/03 ,  H05K1/00 ,  H05K3/28 ,  G03F7/004

CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/0233 ,  H05K3/287 ,  H05K3/4676

摘要： Disclosed is a positive photosensitive insulating resin composition including:
(A) an alkali soluble resin,
(B) a compound having a quinonediazide group, and
(C) an epoxy resin having a softening point of not lower than 30°C; and a cured product which is obtained by curing the composition.
The cured product obtained by curing the composition is excellent in resolution, electrical insulation, thermal shock resistance and adhesion, and exhibits reduced deformation after post-baking.

摘要翻译： 公开了一种正型感光性绝缘树脂组合物包括：（A）碱溶性树脂，（B）具有醌二叠氮基的化合物，并且具有不低于30℃的软化点（C）环氧树脂; 和固化的产品中的所有其通过固化该组合物获得。 通过固化组合物获得的固化产物具有优异的分辨率，电绝缘性，耐热冲击性和密合性，和展品后烘焙之后减小变形。

公开(公告)号：EP1296186A1

公开(公告)日：2003-03-26

申请号：EP02019996.4

申请日：2002-09-05

申请人： JSR Corporation

发明人： Shiraki, Shinji ,  Suzuki, Masayoshi ,  Sasaki, Hirofumi ,  Niwa, Kazuaki

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/027 ,  G03F7/033 ,  G03F7/00 ,  H05B33/00 ,  H05B33/10 ,  H05B33/14 ,  H05B33/22 ,  C08K5/00 ,  C08L27/12

CPC分类号： G03F7/0755 ,  C08K5/34926 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0385 ,  C08L27/12

摘要： A radiation sensitive resin composition for forming a rib comprising (A) a copolymer of (a-1) hexafluoropropylene, (a-2) an unsaturated carboxylic acid and/or unsaturated carboxylic anhydride and (a-3) an unsaturated compound other than the components (a-1) and (a-2), (B) an acid generating compound which generates an acid upon exposure to radiation, (C) a crosslinkable compound and (D) a fluorine-containing organic compound other than the component (A). A rib formed from the composition, a rib forming method, and an organic EL display element and liquid crystal display element having the rib.
The rib does not cause a "satellite" phenomenon when an organic EL layer or ITO transparent electrodes are formed by coating, and an organic EL display element and liquid crystal display element having the rib of the present invention are excellent in productivity and reliability.

摘要翻译： 用于形成肋，其包含（A）（A-1）六氟丙烯的共聚物中，（a-2）不饱和羧酸和/或不饱和羧酸酐和（a-3）不饱和化合物比其他的辐射敏感性树脂组合物 组分（a-1）和（a-2），（B）产酸化合物在暴露于辐射产生酸，（C）可交联的化合物和（D）成分以外的含氟有机化合物（ A）。 从该组合物中，肋成形方法形成的肋，以及有机EL显示元件以及具有该肋的液晶显示元件。 肋不会导致“卫星”现象当有机EL层或ITO透明电极通过涂布形成，并且有机EL显示元件和具有本发明的肋液晶显示元件具有优异的生产性和可靠性。

公开(公告)号：EP1755365B1

公开(公告)日：2009-05-06

申请号：EP06119171.4

申请日：2006-08-18

申请人： JSR Corporation

发明人： Sasaki, Hirofumi ,  Ito, Atsushi ,  Goto, Hirofumi ,  Hashiguchi, Yuichi

IPC分类号： H05K1/03 ,  H05K1/00 ,  H05K3/28 ,  G03F7/004

CPC分类号： G03F7/0236 ,  G03F7/0226 ,  G03F7/0233 ,  H05K3/287 ,  H05K3/4676

公开(公告)号：EP1296186B1

公开(公告)日：2006-06-07

申请号：EP02019996.4

申请日：2002-09-05

申请人： JSR Corporation

发明人： Shiraki, Shinji ,  Suzuki, Masayoshi ,  Sasaki, Hirofumi ,  Niwa, Kazuaki

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/027 ,  G03F7/033 ,  G03F7/00 ,  H05B33/00 ,  H05B33/10 ,  H05B33/14 ,  H05B33/22 ,  C08K5/00 ,  C08L27/12

CPC分类号： G03F7/0755 ,  C08K5/34926 ,  G03F7/0007 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0385 ,  C08L27/12

公开(公告)号：EP1331518A3

公开(公告)日：2004-04-07

申请号：EP03001530.9

申请日：2003-01-23

申请人： JSR Corporation

发明人： Shiraki, Shinji ,  Suzuki, Masayoshi ,  Sasaki, Hirofumi ,  Niwa, Kazuaki ,  Nishikawa, Michinori

IPC分类号： G03F7/075 ,  G03F7/004 ,  G02F1/135 ,  G02F1/136 ,  H01L21/312 ,  H01L33/00 ,  G03F7/00

CPC分类号： G03F7/0757 ,  G03F7/0007 ,  G03F7/0045

摘要： There is disclosed a radiation sensitive composition containing a silane compound represented by the following formula (1):(R 1 ) p Si(X) 4-p wherein R 1 is an unhydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3, a hydrolyzate thereof and a condensate of the hydrolyzate; and a compound which generates an acid or base upon exposure to radiation. The composition is used to form an insulating film for an organic EL display device, and an interlayer insulating film for a liquid crystal display device.

公开(公告)号：EP1193557A1

公开(公告)日：2002-04-03

申请号：EP01121364.2

申请日：2001-09-06

申请人： JSR Corporation

发明人： Nishimura, Isao ,  Suzuki, Masayoshi ,  Sasaki, Hirofumi ,  Niwa, Kazuaki

IPC分类号： G03F7/038 ,  G03F7/004 ,  H01L27/00

CPC分类号： G03F7/038 ,  G03F7/0045 ,  H01L27/3295 ,  H01L51/5203 ,  Y10S430/106 ,  Y10S430/111

摘要： A radiation sensitive resin composition for the formation of cathode separators for EL display devices which have heat resistance and adhesion required for cathode separators for EL display devices and an inversely tapered shape, cathode separators formed therefrom and an EL display device comprising the cathode separators.
The radiation sensitive resin composition for the formation of cathode separators for EL display devices comprises (A) an alkali soluble resin, (B) the compound represented by the formulae (I) to (IV) and (C) a trihalomethyltriazine and/or an onium salt, the cathode separators are formed from the radiation sensitive resin composition and the EL display device comprises the cathode separators formed from the radiation sensitive resin composition.

摘要翻译： 用于形成阴极隔离物为所需的阴极隔离为EL显示装置的耐热性和粘合性和以倒锥形形状，从和到EL显示装置，包括阴极隔板在那里形成阴极隔离哪个具有EL显示装置的辐射敏感性树脂组合物。 用于形成阴极隔离物为EL显示装置包括（A）碱溶性树脂的辐射敏感性树脂组合物，（B）由式餐饮（I）至（IV）和（C）一种三卤甲基三和/或表示的化合物 鎓盐中，阴极隔板从放射线敏感性树脂组合物形成，并且所述EL显示器件包括从所述辐射敏感性树脂组合物形成的阴极隔离。