摘要:
A method of manufacturing an optical information recording medium by forming a thin film in a part of an optical information recording medium by the use of a sputtering target formed from a material obtained by adding B 2 O 3 to an In 2 O 3 -ZnO-SnO 2 system compound oxide having SnO 2 as its primary component, wherein the sputtering target is formed from oxide composed with the respective element ratios being In/(In + Zn + Sn + B) = 0.01 to 0.41, Zn/(In + Zn + Sn + B) = 0.02 to 0.45, Sn/(In + Zn + Sn + B) = 0.13 to 0.81, and B/(In + Zn + Sn + B) = 0.09 to 0.66.
摘要:
A sputtering target formed from a material obtained by adding any one or both of SiO 2 and B 2 O 3 oxides to an In 2 O 3 -ZnO-SnO 2 system compound oxide having SnO 2 as its primary component. The present invention relates to a thin film for an optical information recording medium (especially used as a protective film) that has stable film amorphous nature, realizes high deposition speed, is superior in adhesiveness and mechanical properties with the recording layer, has a high transmission factor, and is composed with a non-sulfide system, whereby the deterioration of the adjacent reflective layer and recording layer can be suppressed. The present invention also relates to a manufacturing method of such a thin film, and a sputtering target for use therein. Accordingly, in addition to improving the performance of the optical information recording medium, the productivity can also be considerably improved.
摘要:
A sputtering target formed from a material obtained by adding any one or both of SiO 2 and B 2 O 3 oxides to an In 2 O 3 -ZnO-SnO 2 system compound oxide having SnO 2 as its primary component. The present invention relates to a thin film for an optical information recording medium (especially used as a protective film) that has stable film amorphous nature, realizes high deposition speed, is superior in adhesiveness and mechanical properties with the recording layer, has a high transmission factor, and is composed with a non-sulfide system, whereby the deterioration of the adjacent reflective layer and recording layer can be suppressed. The present invention also relates to a manufacturing method of such a thin film, and a sputtering target for use therein. Accordingly, in addition to improving the performance of the optical information recording medium, the productivity can also be considerably improved.