摘要:
When a resist composition is applied onto a silicon wafer, the resist composition scattering from a spinner is collected into a preparatory recovery tank (2) and is then sent into a recovery tank (3) having a thermostating means (6) and a viscosity measurement means (4). When the viscosity of the resist composition in the recovery tank is found high on measurement, a necessary amount of a solvent is supplied automatically from solvent supply means (5, 5') to adjust the viscosity to a specified one, and the resist composition is stored in a storage tank (7) and is sent to a coating chamber (1) when necessary. In this manner, the scattering resist can be reused.
摘要:
When a resist composition is applied onto a silicon wafer, the resist composition scattering from a spinner is collected into a preparatory recovery tank (2) and is then sent into a recovery tank (3) having a thermostating means (6) and a viscosity measurement means (4). When the viscosity of the resist composition in the recovery tank is found high on measurement, a necessary amount of a solvent is supplied automatically from solvent supply means (5, 5') to adjust the viscosity to a specified one, and the resist composition is stored in a storage tank (7) and is sent to a coating chamber (1) when necessary. In this manner, the scattering resist can be reused.