METHOD AND APPARATUS FOR RECOVERING AND REUSING RESIST COMPOSITION
    1.
    发明授权
    METHOD AND APPARATUS FOR RECOVERING AND REUSING RESIST COMPOSITION 失效
    装置和方法进行回收和光刻胶组合物再利用。

    公开(公告)号:EP0296249B1

    公开(公告)日:1994-08-31

    申请号:EP88900587.2

    申请日:1987-12-25

    CPC分类号: G03F7/162 Y10T137/2506

    摘要: When a resist composition is applied onto a silicon wafer, the resist composition scattering from a spinner is collected into a preparatory recovery tank (2) and is then sent into a recovery tank (3) having a thermostating means (6) and a viscosity measurement means (4). When the viscosity of the resist composition in the recovery tank is found high on measurement, a necessary amount of a solvent is supplied automatically from solvent supply means (5, 5') to adjust the viscosity to a specified one, and the resist composition is stored in a storage tank (7) and is sent to a coating chamber (1) when necessary. In this manner, the scattering resist can be reused.

    METHOD AND APPARATUS FOR RECOVERING AND REUSING RESIST COMPOSITION
    2.
    发明公开
    METHOD AND APPARATUS FOR RECOVERING AND REUSING RESIST COMPOSITION 失效
    VORRICHTUNG UND VERFAHREN ZUR WIEDERGEWINNUNG UND WIVERERVERWENDUNG EINER RESISTZUSAMMENSETZUNG。

    公开(公告)号:EP0296249A1

    公开(公告)日:1988-12-28

    申请号:EP88900587.2

    申请日:1987-12-25

    CPC分类号: G03F7/162 Y10T137/2506

    摘要: When a resist composition is applied onto a silicon wafer, the resist composition scattering from a spinner is collected into a preparatory recovery tank (2) and is then sent into a recovery tank (3) having a thermostating means (6) and a viscosity measurement means (4). When the viscosity of the resist composition in the recovery tank is found high on measurement, a necessary amount of a solvent is supplied automatically from solvent supply means (5, 5') to adjust the viscosity to a specified one, and the resist composition is stored in a storage tank (7) and is sent to a coating chamber (1) when necessary. In this manner, the scattering resist can be reused.

    摘要翻译: 在涂布室(1)中的硅晶片施加期间从旋转器散射的抗蚀剂组合物被收集到一个预备回收罐(2,2')中,然后被送到具有温度传感器(3)的回收罐(3) 8),液位传感器(9)和粘度传感器(4)。 回收罐(3)在恒温下保持(6),而通过电动阀(5')自动供给必要量的溶剂(5)将抗蚀剂组合物的粘度调整到预定值, 。 然后将抗蚀剂组合物储存在保持恒温的储罐(7)中,并在必要时重新使用在涂料室中,过滤(11)不期望的物质后。