公开(公告)号：EP1654118A1

公开(公告)日：2006-05-10

申请号：EP04763933.1

申请日：2004-08-09

申请人： Kodak Polychrome Graphics GmbH

发明人： HAUCK, Gerhard ,  FRANK, Dietmar

IPC分类号： B41C1/10

CPC分类号： B41C1/1008 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/20 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  Y10S430/106 ,  Y10S430/165

摘要： Heat-sensitive element comprising a) an optionally pretreated substrate; b) a positive working coating comprising (i) at least 40 wt.-%, based on the dry weight of the coating, of at least one polymer soluble in aqueous alkaline developer selected from novolak resins, functionalized novolak resins, polyvinylphenol resins, polyvinyl cresols and poly(meth)acrylates with phenolic and/or sulfonamide side groups, (ii) 01-20 wt.-%, based on the dry weight of the coating, of at least one (C4-C20 alkyl)phenol novolak resin insoluble in aqueous alkaline developer, and (iii) optionally at least one further component selected from polymer particles, surfactants, contrast dyes and pigments, inorganic fillers, antioxidants, print-out dyes, carboxylic acid derivatives of cellulose polymers, plasticizers and substances capable of absorbing radiation of a wavelength from the range of 650 to 1,300 nm and converting it into heat.

公开(公告)号：EP1673222A1

公开(公告)日：2006-06-28

申请号：EP04790279.6

申请日：2004-10-11

申请人： Kodak Polychrome Graphics GmbH

发明人： SAVARIAR-HAUCK, Celin ,  HAUCK, Gerhard ,  FRANK, Dietmar

IPC分类号： B41C1/10 ,  B41M5/36

CPC分类号： B41C1/1016 ,  B41C2210/02 ,  B41C2210/06 ,  B41C2210/14 ,  B41C2210/22 ,  B41C2210/24 ,  B41C2210/262 ,  B41M5/368

摘要： The invention relates to a process for the production of a heat-sensitive imageable element comprising: (a) providing a substrate, (b) applying a first coating solution, comprising at least one photothermal conversion material, at least one polymer A soluble or swellable in an aqueous alkaline developer and at least one solvent, (c) drying, (d) applying a second coating solution, comprising at least one cross-linkable polyfunctional enolether, at least one polymer B comprising hydroxy groups and/or carboxy groups, and at least one solvent, wherein the polymer used in the first coating solution does not dissolve in this solvent, wherein the second coating solution does not contain a photothermal conversion material, and (e) drying at a temperature of at least 60°C.

公开(公告)号：EP1846250A2

公开(公告)日：2007-10-24

申请号：EP06706211.7

申请日：2006-01-12

申请人： Kodak Polychrome Graphics GmbH

发明人： BAUMANN, Harald ,  STREHMEL, Bernd ,  FIEBAG, Ulrich ,  VON GYLDENFELDT, Friederike ,  EBHARDT, Tanja ,  DALLMANN, Ulrike ,  FRANK, Dietmar

IPC分类号： B41N3/00 ,  B41C1/10 ,  C08J5/18

CPC分类号： C08G77/30 ,  B41N1/083 ,  B41N1/086 ,  B41N1/14 ,  B41N3/038 ,  B41N3/08 ,  C08G77/395 ,  C08K5/5406 ,  Y10S430/145

摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).