公开(公告)号：EP0841099A1

公开(公告)日：1998-05-13

申请号：EP97119294.3

申请日：1997-11-05

申请人： MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD

发明人： Otake, Tadashi ,  Mino, Norihisa ,  Nakagawa, Tohru ,  Soga, Mamoru ,  Ogawa, Kazufumi ,  Nomura, Takaiki ,  Takebe, Yasuo

IPC分类号： B05D1/28

CPC分类号： B82Y30/00 ,  B05D1/283 ,  B05D3/0486 ,  B82Y40/00

摘要： A method for forming a molecular film includes the steps of:

coating a surface of a substrate having active hydrogen atoms on its surface with a coating solution containing a silane-based compound having at least one reactive group selected from the group consisting of a chloro group, an alkoxy group and an isocyanate group; and effecting an elimination reaction between the active hydrogen atoms on the surface of the substrate and reactive groups of the silane-based compound, thereby covalently bonding the silane-based compounds to the surface of the substrate. The substrate 2 is supplied to a chamber 11 in which an atmosphere is maintained at a low water vapor density. The surface of the substrate is coated with a coating solution containing the silane-based compound and a solvent by using a transfer element. A dehydrochlorination reaction is effected between the active hydrogen atoms and the chloro groups of the silane-based compounds. Thereafter, any coating solution containing unreacted silane-based compounds after coating is removed inside or outside the chamber 11.

摘要翻译： 形成分子膜的方法包括以下步骤：用含有至少一个选自氯基团的反应性基团的硅烷类化合物的涂布溶液在其表面上涂布具有活性氢原子的基材的表面 ，烷氧基和异氰酸酯基; 并且进行基板表面上的活性氢原子与硅烷类化合物的反应性基团之间的消除反应，从而将硅烷类化合物共价键合到基板的表面。 将基板2供给到气氛保持低水蒸气密度的室11。 通过使用转印元件，将含有硅烷类化合物和溶剂的涂布液涂布在基材的表面上。 在活性氢原子和硅烷基化合物的氯基之间进行脱氯化氢反应。 此后，在室11内或室外除去涂布后含有未反应的硅烷类化合物的任何涂布溶液