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公开(公告)号：EP0600303A3
公开(公告)日：1995-08-02
申请号：EP93118535.9
申请日：1993-11-18
发明人： Hayashi, Shigenori , Komaki, Kazuki , Kamada, Takeshi , Kitagawa, Masatoshi , Deguchi, Takashi , Takayama, Ryoichi , Hirao, Takashi
IPC分类号： H01L21/3205 , H01L21/82 , H01L21/316 , C23C14/34 , C23C14/08
CPC分类号： C23C14/5853 , C23C14/0078 , C23C14/088 , G02F1/0027 , H01L21/02197 , H01L21/02266 , H01L21/314 , H01L21/31691 , H01L37/025 , H01L41/1875 , H01L41/316
摘要： A method whereby perovskite type oxide dielectric thin films with ABO₃ structure are able to be formed with such features as good stability, uniformity, reproducibility, or the like, and, on top of that, with high through-put by having a deposition process, wherein the thin films are deposited on a substrate, and a non-deposition process, wherein no deposition of the thin films takes place, repeated alternatingly while the substrate temperature being kept near the temperature at which perovskite type oxide dielectric thin films are formed. Also, by employing (i) a processing method wherein a decomposing excitation of a reactive gas due to plasma takes place on or near the deposition surface in a gaseous atmosphere comprising a gas that reacts with the elements composing the thin films, (ii) a processing method wherein an oxidation reaction takes place on the deposition surface in a gaseous atmospher comprising at least ozone (O₃), and (iii) a processing method wherein light of short wave length is irradiated on the deposition surface in a gaseous atmos phere comprising at least reactive elements in said non-deposition process, the oxygen concentration in the deposited thin films is adjusted and dielectric thin films of good quality and an extremely low defect content are realized.
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公开(公告)号：EP0588643A1
公开(公告)日：1994-03-23
申请号：EP93307326.4
申请日：1993-09-16
IPC分类号： G08B13/191
CPC分类号： G08B13/191
摘要： An infrared sensor composed of an array of pyroelectric type heat detecting elements, a chopper, a chopper operation detecting means for detecting the operation of the chopper, a duty compensating means and a chopper failure detecting means are arranged. Thus, the actual opening and closing duty of the chopper can maintained to be uniform so as to detect a thermal image with a high degree of accuracy, and a failure of the chopper can be detected, thereby it is possible to enhance the reliability of the operation.
摘要翻译： 配置由热电型热探测元件阵列，斩波器，用于检测斩波器操作的斩波器操作检测装置，占空比补偿装置和斩波器故障检测装置组成的红外传感器。 因此，斩波器的实际开关占空比可以保持均匀，从而以高精度检测热图像，并且可以检测斩波器的故障，由此可以提高斩波器的可靠性 操作。
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公开(公告)号：EP0588645B1
公开(公告)日：2000-04-19
申请号：EP93307328.0
申请日：1993-09-16
IPC分类号： G08B13/191
CPC分类号： G08B13/191 , Y10S250/01
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4.发明公开Method and apparatus for fabrication of dielectric thin film 失效Einrichtung und Verfahren zur Herstellung einer elektrischenDünnschicht。
公开(公告)号：EP0600303A2
公开(公告)日：1994-06-08
申请号：EP93118535.9
申请日：1993-11-18
发明人： Hayashi, Shigenori , Komaki, Kazuki , Kamada, Takeshi , Kitagawa, Masatoshi , Deguchi, Takashi , Takayama, Ryoichi , Hirao, Takashi
IPC分类号： H01L21/3205 , H01L21/82 , H01L21/316 , C23C14/34 , C23C14/08
CPC分类号： C23C14/5853 , C23C14/0078 , C23C14/088 , G02F1/0027 , H01L21/02197 , H01L21/02266 , H01L21/314 , H01L21/31691 , H01L37/025 , H01L41/1875 , H01L41/316
摘要： A method whereby perovskite type oxide dielectric thin films with ABO₃ structure are able to be formed with such features as good stability, uniformity, reproducibility, or the like, and, on top of that, with high through-put by having a deposition process, wherein the thin films are deposited on a substrate, and a non-deposition process, wherein no deposition of the thin films takes place, repeated alternatingly while the substrate temperature being kept near the temperature at which perovskite type oxide dielectric thin films are formed.
Also, by employing (i) a processing method wherein a decomposing excitation of a reactive gas due to plasma takes place on or near the deposition surface in a gaseous atmosphere comprising a gas that reacts with the elements composing the thin films, (ii) a processing method wherein an oxidation reaction takes place on the deposition surface in a gaseous atmospher comprising at least ozone (O₃), and (iii) a processing method wherein light of short wave length is irradiated on the deposition surface in a gaseous atmos phere comprising at least reactive elements in said non-deposition process, the oxygen concentration in the deposited thin films is adjusted and dielectric thin films of good quality and an extremely low defect content are realized.摘要翻译： 能够形成具有ABO3结构的钙钛矿型氧化物电介质薄膜的方法，其具有良好的稳定性，均匀性，再现性等特征，而且通过具有沉积工艺的高通量， 其中薄膜沉积在基板上，并且在不沉积薄膜的情况下进行非沉积工艺，在基板温度保持接近形成钙钛矿型氧化物介电薄膜的温度的同时交替重复。 此外，通过采用以下处理方法：（i）在包含与构成薄膜的元素反应的气体的气体气氛中，在等离子体发生的反应气体的分解激发发生在沉积表面上或其附近的处理方法，（ii） 处理方法，其中氧化反应在至少包含臭氧（O 3）的气体气氛中在沉积表面上发生，和（iii）一种处理方法，其中将短波长的光照射在气态大气球的沉积表面上， 所述非沉积工艺中的最小反应元素调节沉积的薄膜中的氧浓度，并且实现质量好和极低缺陷含量的介电薄膜。
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公开(公告)号：EP0600303B1
公开(公告)日：2002-02-06
申请号：EP93118535.9
申请日：1993-11-18
发明人： Hayashi, Shigenori , Komaki, Kazuki , Kamada, Takeshi , Kitagawa, Masatoshi , Deguchi, Takashi , Takayama, Ryoichi , Hirao, Takashi
IPC分类号： H01L21/3205 , H01L21/82 , H01L21/316 , C23C14/34 , C23C14/08
CPC分类号： C23C14/5853 , C23C14/0078 , C23C14/088 , G02F1/0027 , H01L21/02197 , H01L21/02266 , H01L21/314 , H01L21/31691 , H01L37/025 , H01L41/1875 , H01L41/316
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公开(公告)号：EP0588645A1
公开(公告)日：1994-03-23
申请号：EP93307328.0
申请日：1993-09-16
IPC分类号： G08B13/191
CPC分类号： G08B13/191 , Y10S250/01
摘要： An array of pyroelectric type heat detecting elements which are integrally incorporated with an optical system and which are arranged one dimensionally in a plane orthogonal to the optical axis of the optical system, and the optical system and the array of pyroelectric type heat detecting elements are rotated integrally with each other, thereby it is possible to obtain a two dimensional thermal image with a relatively simple structure.
摘要翻译： 一个与光学系统整合在一起的热电型热检测元件阵列，它们在与光学系统的光轴垂直的平面内一维排列，并且光学系统和热电型热检测元件阵列被旋转 一体化，可以得到结构比较简单的二维热像。
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