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    LITHOGRAPHY SYSTEM, MODULATION DEVICE AND METHOD OF MANUFACTURING A FIBER FIXATION SUBSTRATE
    1.
    发明公开
    LITHOGRAPHY SYSTEM, MODULATION DEVICE AND METHOD OF MANUFACTURING A FIBER FIXATION SUBSTRATE 有权
    调制装置以及一种用于生产FASERFIXIERSUBSTRATS用在光刻系统

    公开(公告)号：EP2633544A1

    公开(公告)日：2013-09-04

    申请号：EP11775810.2

    申请日：2011-10-26

    申请人： Mapper Lithography IP B.V.

    发明人： VAN MELLE, Ralph ,  VAN DE PEUT, Teunis ,  DERKS, Henk

    IPC分类号： H01J37/04 ,  H01J37/22 ,  H01J37/317

    CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

    摘要： A charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the plurality of beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals, the light sensitive element being electrically connected to one or more modulators for providing the received pattern data to the one or more modulators, and the beamlet blanker array is coupled to a fiber fixation substrate which accommodates the end sections of a plurality of fibers for providing the pattern data carrying light beams as an assembled group with a fixed connection.

    CHARGED PARTICLE BEAM MODULATOR
    3.
    发明公开
    CHARGED PARTICLE BEAM MODULATOR 有权
    调制器带电粒子

    公开(公告)号：EP2638559A1

    公开(公告)日：2013-09-18

    申请号：EP11784637.8

    申请日：2011-11-14

    申请人： Mapper Lithography IP B.V.

    发明人： WIELAND, Marco Jan-Jaco ,  JAGER, Remco ,  VAN VEEN, Alexander Hendrik Vincent ,  STEENBRINK, Stijn Willem Herman Karel ,  VAN DE PEUT, Teunis ,  DERKS, Henk

    IPC分类号： H01J37/04 ,  H01J37/22 ,  H01J37/317 ,  H01J37/09 ,  H01J37/24

    CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/241 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/2482

    摘要： The invention relates to a charged particle lithography system for transferring a pattern onto the surface of a target. The system comprises a beam generator, a beam stop array and a modulation device. The beam generator is arranged for generating a plurality of charged particle beamlets, the plurality of beamlets defining a column. The beam stop array has a surface for blocking beamlets from reaching the target surface and an array of apertures in the surface for allowing the beamlets to reach the target surface. The modulation device is arranged for modulating the beamlets to prevent one or more of the beamlets from reaching the target surface or allow one or more of the beamlets to reach the target surface, by deflecting or not deflecting the beamlets so that the beamlets are blocked or not blocked by the beam stop array. The modulation device comprises a plurality of apertures with associated modulators; and a plurality of light sensitive elements, both arranged in arrays. A surface area of the modulation device comprises an elongated beam area comprising an array of apertures and associated modulators, and a power interface area for accommodating a power arrangement for suitably powering elements within the modulation device. The power interface area being located alongside a long side of the elongated beam area and extending in a direction substantially parallel thereto.