公开(公告)号：EP2633544A1

公开(公告)日：2013-09-04

申请号：EP11775810.2

申请日：2011-10-26

申请人： Mapper Lithography IP B.V.

发明人： VAN MELLE, Ralph ,  VAN DE PEUT, Teunis ,  DERKS, Henk

IPC分类号： H01J37/04 ,  H01J37/22 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437

摘要： A charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target using a plurality of charged particle beamlets. The system comprises a beam generator for generating a plurality of charged particle beamlets, a beamlet blanker array for patterning the plurality of beamlets in accordance with a pattern, and a projection system for projecting the patterned beamlets onto the target surface. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements, a light sensitive element being arranged to receive pattern data carrying light beams and to convert the light beams into electrical signals, the light sensitive element being electrically connected to one or more modulators for providing the received pattern data to the one or more modulators, and the beamlet blanker array is coupled to a fiber fixation substrate which accommodates the end sections of a plurality of fibers for providing the pattern data carrying light beams as an assembled group with a fixed connection.

公开(公告)号：EP2633544B1

公开(公告)日：2014-09-03

申请号：EP11775810.2

申请日：2011-10-26

申请人： Mapper Lithography IP B.V.

发明人： VAN MELLE, Ralph ,  VAN DE PEUT, Teunis ,  DERKS, Henk

IPC分类号： H01J37/04 ,  H01J37/22 ,  H01J37/317

CPC分类号： H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/22 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0437