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公开(公告)号：EP1162646A3
公开(公告)日：2004-10-13
申请号：EP01112611.7
申请日：2001-05-23
发明人： Yamazaki, Keiichi , Inooka, Yukiko , Sawada, Yasushi , Taguchi, Noriyuki , Nakazono, Yoshiyuki , Nakano, Akio
IPC分类号： H01J37/32
CPC分类号： H01J37/32357
摘要： A plasma treatment apparatus having the capability of uniformly treating an object with plasma at a high treatment speed and a plasma treatment method are provided. This apparatus comprises a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniform means for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.
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公开(公告)号：EP1162646A2
公开(公告)日：2001-12-12
申请号：EP01112611.7
申请日：2001-05-23
发明人： Yamazaki, Keiichi , Inooka, Yukiko , Sawada, Yasushi , Taguchi, Noriyuki , Nakazono, Yoshiyuki , Nakano, Akio
IPC分类号： H01J37/32
CPC分类号： H01J37/32357
摘要： A plasma treatment apparatus having the capability of uniformly treating an object with plasma at a high treatment speed and a plasma treatment method are provided. This apparatus comprises a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniform means for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel.
摘要翻译： 提供了具有以高处理速度等离子体均匀处理物体的等离子体处理装置和等离子体处理方法。 该装置包括具有横向细长横截面的管状容器，一对电极被布置成使得当在电极之间施加AC电压和脉冲电压之一时，电流线基本上沿管状容器的轴向方向显影，a 用于向管状容器供应流光产生气体的气体供应源，用于在电极之间施加电压以在管状容器中产生多个气流的拖缆的电源;以及用于使多个拖缆沿横向均匀的等离子体均匀装置 的管状容器的横向细长横截面以从管状容器的一端提供等离子体。
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公开(公告)号：EP0921713A3
公开(公告)日：1999-08-11
申请号：EP98122873.7
申请日：1998-12-02
CPC分类号： H01J37/32366 , H05H1/2406 , H05H2001/245 , H05H2245/123
摘要： A plasma processing apparatus (K1-K4) for performing plasma processing of an article (7), comprising: a central electrode (3); a tubular outer electrode (1) which is provided so as to surround the central electrode (3); a tubular reaction pipe (2) which is disposed between the central electrode (3) and the outer electrode (1) so as to electrically insulate the central electrode (3) and the outer electrode (1) from each other; a gas supply device (56) for supplying a plasma producing gas to a discharge space (22) defined between the central electrode (3) and the outer electrode (1) in the reaction pipe (2); an AC power source (17) for applying an AC voltage between the central electrode (3) and the outer electrode (1); wherein not only the plasma producing gas is supplied to the discharge space (22) by the gas supply device (56) but the AC voltage is applied between the central electrode (3) and the outer electrode (1) by the AC power source (17) so as to generate a glow discharge in the discharge space (22) under atmospheric pressure such that a plasma jet (55) is blown to the article (7) from a blow-off outlet (21) of the reaction pipe (2); and a cooling device (27, 28, 34, 35, 51) for cooling the central electrode (3) and the outer electrode (1).
摘要翻译： 一种用于进行制品（7）的等离子体处理的等离子体处理装置（K1-K4），包括：中心电极（3）; 设置成围绕中心电极（3）的管状外电极（1）; 管状反应管（2），设置在中心电极（3）与外电极（1）之间，以使中心电极（3）和外电极（1）彼此电绝缘; 用于将等离子体产生气体供给到在反应管（2）中限定在中心电极（3）和外电极（1）之间的放电空间（22）的气体供应装置（56）; 用于在中心电极（3）和外电极（1）之间施加AC电压的AC电源（17）; 其特征在于，不仅通过气体供给装置（56）将等离子体产生气体供给到放电空间（22），而且通过交流电源将交流电压施加在中心电极（3）和外部电极（1）之间 17），以在大气压下在放电空间（22）中产生辉光放电，使得等离子体射流（55）从反应管（2）的吹出口（21）吹送到制品（7） ）; 以及用于冷却中心电极（3）和外电极（1）的冷却装置（27,28,34,35,51）。
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公开(公告)号：EP0921713A2
公开(公告)日：1999-06-09
申请号：EP98122873.7
申请日：1998-12-02
CPC分类号： H01J37/32366 , H05H1/2406 , H05H2001/245 , H05H2245/123
摘要： A plasma processing apparatus (K1-K4) for performing plasma processing of an article (7), comprising: a central electrode (3); a tubular outer electrode (1) which is provided so as to surround the central electrode (3); a tubular reaction pipe (2) which is disposed between the central electrode (3) and the outer electrode (1) so as to electrically insulate the central electrode (3) and the outer electrode (1) from each other; a gas supply device (56) for supplying a plasma producing gas to a discharge space (22) defined between the central electrode (3) and the outer electrode (1) in the reaction pipe (2); an AC power source (17) for applying an AC voltage between the central electrode (3) and the outer electrode (1); wherein not only the plasma producing gas is supplied to the discharge space (22) by the gas supply device (56) but the AC voltage is applied between the central electrode (3) and the outer electrode (1) by the AC power source (17) so as to generate a glow discharge in the discharge space (22) under atmospheric pressure such that a plasma jet (55) is blown to the article (7) from a blow-off outlet (21) of the reaction pipe (2); and a cooling device (27, 28, 34, 35, 51) for cooling the central electrode (3) and the outer electrode (1).
摘要翻译： 一种等离子体处理装置（K1-K4），用于对物品（7）进行等离子体处理，该等离子体处理装置包括：中心电极（3）;以及中心电极 以包围中心电极（3）的方式设置的筒状的外部电极（1） 设置在中心电极（3）和外部电极（1）之间以使中心电极（3）和外部电极（1）彼此电绝缘的管状反应管（2） （2）中的中心电极（3）和外部电极（1）之间的放电空间（22）供给等离子体生成气体的气体供给装置（56）。 交流电源（17），用于在中心电极（3）和外部电极（1）之间施加交流电压; 其中不仅通过气体供应装置（56）将等离子体产生气体供应到放电空间（22），而且AC电压通过AC电源施加在中心电极（3）和外部电极（1）之间 17），以便在大气压下在放电空间（22）中产生辉光放电，使得等离子体射流（55）从反应管（2）的吹出口（21）吹向制品 ）; 以及用于冷却中心电极（3）和外部电极（1）的冷却装置（27,28,34,35,51）。
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