VERFAHREN UND VORRICHTUNG ZUR HERSTELLUNG EINER FRESNEL-ZONENPLATTE

    公开(公告)号:EP2504725A1

    公开(公告)日:2012-10-03

    申请号:EP10763729.0

    申请日:2010-10-15

    IPC分类号: G02B5/18

    摘要: Process for producing a Fresnel zone plate (13), comprising: - the provision of a substrate (1, 4, 7) which is rotationally symmetrical with respect to the central axis (1a, 4a, 7a) thereof; - the application of successive layers (2a - d; 5a - d; 8a - d; 11) by means of an atomic layer deposition (ALD) process to areas (1b - c; 4b - c; 7b - c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate; and - the separation (3a, b; 6a, b; 9a, b) of at least one disc (13) from the coated substrate (1, 4, 7) by dividing the coated substrate (1, 4, 7) at least once perpendicular to the central axis (1a, 4a, 7a).

    摘要翻译: 一种制造菲涅耳带片(15)的方法,包括:提供相对于其中心轴线(1a,4a,7a)旋转对称的衬底(1,4,7); 通过原子层沉积(ALD)方法依次连接到基板(1b-c; 4b-c; 7b-c)上的层(2a-d; 5a-d; 8a-d; 11) 1,4,7),以便形成涂覆的基底,并且切断(3a,b; 6a,b; 9a,b)至少一个切片(13) 被涂覆的基板(1,4,7)与中心轴线(1a,4a,7a)成直角分割至少一次。

    METHOD OF PRODUCING A FRESNEL ZONE PLATE FOR APPLICATIONS IN HIGH ENERGY RADIATION
    3.
    发明公开
    METHOD OF PRODUCING A FRESNEL ZONE PLATE FOR APPLICATIONS IN HIGH ENERGY RADIATION 审中-公开
    VERFAHREN ZUR HERSTELLUNG EINER FRESNEL-ZONENPLATTEFÜRANWENDUNGEN在HOCHENERGETISCHER STRAHLUNG

    公开(公告)号:EP2823489A2

    公开(公告)日:2015-01-14

    申请号:EP13707893.7

    申请日:2013-03-07

    IPC分类号: G21K1/06

    摘要: The invention concerns to a method of producing a Fresnel Zone Plate (1) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.

    摘要翻译: 本发明涉及一种生产用于高能量辐射的菲涅尔区带板(1)的方法,包括以下步骤:供给高能量辐射透明的基底(2),金属层(3)的沉积, 在基板(2)的平面(4)上的金属合金或金属化合物,用数学模型计算三维几何轮廓(5),设置用于离子的离子束的剂量曲线(6) 光束光刻与计算的三维几何轮廓(5)相反,并且通过离子束光刻通过聚焦离子束将具有同心区域的三维几何轮廓(5)铣削到层(3)中。