摘要:
Process for producing a Fresnel zone plate (13), comprising: - the provision of a substrate (1, 4, 7) which is rotationally symmetrical with respect to the central axis (1a, 4a, 7a) thereof; - the application of successive layers (2a - d; 5a - d; 8a - d; 11) by means of an atomic layer deposition (ALD) process to areas (1b - c; 4b - c; 7b - c) of the substrate (1, 4, 7) without rotation of the substrate (1, 4, 7) in order to form a coated substrate; and - the separation (3a, b; 6a, b; 9a, b) of at least one disc (13) from the coated substrate (1, 4, 7) by dividing the coated substrate (1, 4, 7) at least once perpendicular to the central axis (1a, 4a, 7a).
摘要:
The invention concerns to a method of producing a Fresnel Zone Plate (1) for applications in high energy radiation including the following steps: supply of a substrate (2) transparent for high energy radiation, deposition of a layer (3) of a metal, a metal alloy or a metal compound on a planar surface (4) of the substrate (2), calculating a three dimensional geometrical profile (5) with a mathematical model, setting up a dosage profile (6) for an ion beam of the ion beam lithography inverse to the calculated three dimensional geometrical profile (5) and milling a three dimensional geometrical profile (5) with concentric zones into the layer (3) with ion beam lithography by means of focused ion beam.