公开(公告)号：EP1549414A1

公开(公告)日：2005-07-06

申请号：EP03739089.5

申请日：2003-06-11

申请人： Mykrolis Corporation ,  Spiegelman, Jeffrey, J ,  Alvarez, Daniel, Jr. ,  Cook, Joshua T.

发明人： SPIEGELMAN, Jeffrey, J. ,  ALVAREZ, Daniel, Jr. ,  COOK, Joshua, T.

IPC分类号： B01D53/04

CPC分类号： B01D53/02 ,  B01D53/04 ,  B01D2259/40086 ,  B01J20/28057 ,  B01J20/3458 ,  B01J20/3491

摘要： A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to

公开(公告)号：EP1551531A1

公开(公告)日：2005-07-13

申请号：EP03777652.3

申请日：2003-10-16

申请人： Mykrolis Corporation

发明人： ALVAREZ, Daniel, Jr. ,  SPIEGELMAN, Jeffrey, J. ,  HOLMES, Russell, J.

IPC分类号： B01D53/04 ,  C01B31/20 ,  B01J20/06

CPC分类号： B01D53/02 ,  B01D53/04 ,  B01D2253/10 ,  B01D2253/112 ,  B01D2256/22 ,  B01D2257/104 ,  B01D2257/308 ,  B01D2257/404 ,  B01D2257/406 ,  B01D2257/702 ,  B01D2257/80 ,  B01D2259/40083 ,  B01D2259/402 ,  B01J20/06 ,  B01J20/3433 ,  B01J20/3458 ,  B01J20/3483 ,  B01J2220/42 ,  C01B32/50 ,  Y02C10/08

摘要： The invention is a method for the decontamination of CO 2 to a sufficient level of purity to allow it to be used in the semiconductor industry. The invention comprises the exposure of fluid CO 2 to a combination metallic states of at least one metal under the appropriate conditions for removal of contaminants. The adsorbents are then decontaminated/activated to return the adsorbent to a mixed oxidation state and allow further rounds of decontamination. The adsorbents are selected to be complimentary to each other, preferentially adsorbing different contaminants. Additionally, the adsorbents are selected to undergo reduction differently such that upon regeneration only a portion of the metals are reduced and the adsorbent is returned essentially to its original state.

摘要翻译： 本发明是一种用于将CO 2 2去污的方法，使其具有足够的纯度以使其可用于半导体工业。 本发明包括在适合除去污染物的条件下将流体CO 2 2暴露于至少一种金属的组合金属状态。 然后将吸附剂去污/活化，以将吸附剂返回到混合氧化状态，并允许进一步的去污染。 吸附剂被选择为彼此互补，优先吸附不同的污染物。 此外，选择吸附剂进行不同的还原，使得在再生时，只有一部分金属被还原，并且吸附剂基本恢复到其初始状态。

公开(公告)号：EP1595132A2

公开(公告)日：2005-11-16

申请号：EP04713293.1

申请日：2004-02-20

申请人： Mykrolis Corporation

发明人： SPIEGELMAN, Jeffrey, J. ,  ALVAREZ, Daniel, Jr. ,  TRAM, Allan

IPC分类号： G01N1/22 ,  G01N1/34 ,  G01N33/00

CPC分类号： G01N30/12 ,  G01N1/2214 ,  G01N1/44 ,  G01N2030/085 ,  Y10T436/25 ,  Y10T436/25375 ,  Y10T436/255

摘要： The present invention relates to the monitoring of contaminant concentrations in manufacturing processes that employ fluid purification devices. The invention provides a sensitive method for analyzing contaminant concentrations in a process fluid stream using purification material to adsorb contaminants contained therein over an entire process.