公开(公告)号：EP3896722A1

公开(公告)日：2021-10-20

申请号：EP19897308.3

申请日：2019-12-03

Applicant: NHK Spring Co., Ltd.

Inventor： ARAKI, Yoshihito ,  MOROTA, Shuhei ,  HANAMACHI,Toshihiko ,  YOKOYAMA, Hibiki

IPC: H01L21/683

Abstract: A plate with a flow channel according to the present invention includes: a main body portion in which a flow channel to let inert gas flow is formed; and a cover that covers a surface of the main body portion in which surface the flow channel is formed, wherein a buried member buried in an opening of the flow channel is provided in the flow channel of the main body portion, the buried member includes a buried portion fixed to the flow channel, and a flow portion that is held by the buried portion and that lets the inert gas flow from the inside to the outside of the main body portion, a plurality of through holes is provided in the flow portion, the buried member and the flow channel are fixed to each other by an insulating adhesive, and a ratio of a diameter of an outer circumference of the buried portion to a diameter of a smallest circle among circles including all the through holes is 1.2 or higher.

公开(公告)号：EP3933065A1

公开(公告)日：2022-01-05

申请号：EP20766608.2

申请日：2020-02-25

Applicant: NHK Spring Co., Ltd.

Inventor： HANAMACHI, Toshihiko ,  MOROTA, Shuhei ,  TAKIMOTO, Masaru ,  ARAKI, Yoshihito ,  YOKOYAMA, Hibiki ,  FUJII, Masahiro

IPC: C23C4/12 ,  H01L21/3065 ,  H01L21/683

Abstract: A stage includes a base material having a first surface and a second surface adjacent to the first surface, and an insulating film including a plurality of particles, each of the plurality of particles having a flat surface. The flat surface is provided along the first surface and the second surface. The base material includes a third surface in a direction 180 degrees opposite to the first surface, and a part of the flat surface included in the insulating film is provided along the third surface, and a surface obtained by extending the first surface and a surface obtained by extending the second surface intersect at 90 degrees. The base material includes a third surface in a direction 180 degrees opposite to the first surface, and a part of the flat surface included in the insulating film is provided along the third surface.

公开(公告)号：EP3826435A1

公开(公告)日：2021-05-26

申请号：EP19838458.8

申请日：2019-07-17

Applicant: NHK Spring Co., Ltd. ,  Izumi Techno Inc.

Inventor： HANAMACHI, Toshihiko ,  MOROTA, Shuhei ,  TAKAHARA, Go ,  TAKIMOTO, Masaru ,  YOKOYAMA, Hibiki ,  MITSUDA, Hiroshi ,  ARAKI, Yoshihito ,  AJISAWA, Kengo

IPC: H05H1/24 ,  C23C28/04 ,  C25D11/04 ,  C25D11/12 ,  C25D11/18 ,  H01L21/3065 ,  C25D11/00

Abstract: A member for a plasma processing device according to the present invention includes an aluminum base material, and an oxide film formed on the aluminum base material and has a porous structure. The oxide film includes a first oxide film formed on a surface of the aluminum base material, a second oxide film formed opposite to the aluminum base material side of the first oxide film, and a third oxide film formed opposite to the first oxide film side of the second oxide film. The first oxide film is harder than the second oxide film and the third oxide film. A hole formed in each of the first oxide film, the second oxide film and the third oxide film is sealed.