METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL
    1.
    发明公开
    METHOD OF MANUFACTURING COMPOUND SEMICONDUCTOR SINGLE CRYSTAL 有权
    用于生产化合物半导体单晶构成

    公开(公告)号:EP0992618A4

    公开(公告)日:2005-09-07

    申请号:EP99910741

    申请日:1999-03-29

    IPC分类号: C30B11/00 C30B29/40

    摘要: A method of manufacturing a compound semiconductor single crystal as a first embodiment, comprising charging compound semiconductor materials into a crucible having an inverted conical increased-diameter part at the lower end thereof and a seed crystal storing part at the center of the bottom of the increased-diameter part, enclosing the crucible into a container, placing the container in a vertical heating furnace to melt the materials by heating and solidifying the obtained material molten liquid in the upward direction by gradually cooling the liquid from below, characterized in that a crystal growth speed at the increased-diameter part of the crucible is 20 mm/hr or higher at the time of the solidification. A method of manufacturing a compound semiconductor single crystal as a second embodiment, comprising placing a bottomed cylindrical crucible supported by a supporting means in a hot zone surrounded by a tubular refractory wall and an upper lid inside a high pressure container and gradually cooling a molten compound semiconductor liquid stored in the crucible from below, characterized in that a temperature fluctuation in the hot zone is reduced by inducing by a gas flow induction means a gas stream flowing form below to above around the crucible.