EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
    2.
    发明公开
    EXPOSURE APPARATUS, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD 审中-公开
    曝光装置,曝光方法及元件制造工艺

    公开(公告)号:EP1956431A4

    公开(公告)日:2009-06-24

    申请号:EP06832647

    申请日:2006-11-15

    申请人: NIPPON KOGAKU KK

    IPC分类号: G03F7/20 G03F1/14 H01L21/027

    摘要: A pattern image generation device (10,12, PL) generates a pattern image, and at least a part of the pattern image which has been generated or the pattern image which is generated and is formed on an object is photoelectrically detected by a detection system (42, 48). Then, a correction device (32) corrects design data that should be input to the pattern image generation device based on the detection results. Accordingly, a pattern image is generated on an object (P) by the pattern image generation device corresponding to the input of the design data after the correction, and because the object is exposed using the pattern image, a desired pattern is formed on the object with good precision.

    INFECTION SPREAD PREVENTION SUPPORT SYSTEM, INFECTION SPREAD PREVENTION SUPPORT SERVER, EXAMINATION TERMINAL, MOBILE TERMINAL AND PROGRAM
    3.
    发明公开
    INFECTION SPREAD PREVENTION SUPPORT SYSTEM, INFECTION SPREAD PREVENTION SUPPORT SERVER, EXAMINATION TERMINAL, MOBILE TERMINAL AND PROGRAM 审中-公开
    系统支持增殖感染的预防,服务器支持增殖的感染,研究终端,移动终端和程序THEREFOR预防

    公开(公告)号:EP2590134A4

    公开(公告)日:2016-04-27

    申请号:EP11800897

    申请日:2011-06-29

    申请人: NIPPON KOGAKU KK

    IPC分类号: G06Q50/22 G06F19/00

    CPC分类号: G06F19/34 G06Q50/22

    摘要: An infection spread prevention support system includes an examination terminal and an infection spread prevention support server. The examination terminal includes an examination information acquisition unit that acquires examination information to examine the infection of an infectious disease in subjects and a transmission and reception unit that transmits the examination information to the infection spread prevention support server. The infection spread prevention support server includes a receiving unit that receives examination information, an infection determination unit that determines the presence or degree of infection of the infectious disease using the examination information, an activity regulation information generation unit that generates activity regulation information to regulate the an activity of the infected patient based on infection determination information, which is a determination result of the infection determination unit, and information regarding the subjects, and an output unit that outputs the activity regulation information.

    RETRIEVAL SUPPORT SYSTEM, RETRIEVAL SUPPORT METHOD, AND RETRIEVAL SUPPORT PROGRAM
    5.
    发明公开
    RETRIEVAL SUPPORT SYSTEM, RETRIEVAL SUPPORT METHOD, AND RETRIEVAL SUPPORT PROGRAM 审中-公开
    请求支持系统支持查询的进程和请求援助计划

    公开(公告)号:EP2518641A4

    公开(公告)日:2013-07-24

    申请号:EP10839404

    申请日:2010-12-21

    申请人: NIPPON KOGAKU KK

    IPC分类号: G06Q30/00 G06Q30/06

    摘要: A retrieval support system includes a database (16) which stores commodity image data; a retrieval unit (13) which acquires commodity image data having image characteristic information which is the same as or similar to image characteristic information indicating a characteristic in an image of input image data, from the database (16), with respect to the input image data; and a condition setting unit (18, 32) which sets a retrieval condition including at least one of time information relating to time, place information relating to places and occasion information relating to occasions. The retrieval unit (13) performs retrieval of the commodity image data based on the retrieval condition set by the condition setting unit (18, 32). The commodity image data acquired by the retrieval unit (13) and information relating to a commodity different from a commodity corresponding to the commodity image data are output together.

    LASER PLASMA EUV LIGHT SOURCE, TARGET MEMBER, PRODUCTION METHOD FOR TARGET MEMBER, TARGET SUPPLYING METHOD, AND EUV EXPOSURE SYSTEM
    8.
    发明公开
    LASER PLASMA EUV LIGHT SOURCE, TARGET MEMBER, PRODUCTION METHOD FOR TARGET MEMBER, TARGET SUPPLYING METHOD, AND EUV EXPOSURE SYSTEM 审中-公开
    激光等离子体EUV光源,目标会员,METHOD FOR ONE GOAL四肢,目的在于提供一种方法和EUV曝光系统

    公开(公告)号:EP1837897A4

    公开(公告)日:2008-04-16

    申请号:EP05822789

    申请日:2005-12-27

    申请人: NIPPON KOGAKU KK

    IPC分类号: G03F7/20 H05G2/00

    摘要: Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1. Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1, pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1. The spot diameter of the laser is the same 1 mm diameter as that of target 1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.