公开(公告)号：EP2590134A4

公开(公告)日：2016-04-27

申请号：EP11800897

申请日：2011-06-29

申请人： NIPPON KOGAKU KK

发明人： SHIONO HIROFUMI ,  NEI MASAHIRO ,  INOUE HIDEYA ,  YAMASHITA RYOICHI ,  SHIBAYAMA MIYUKI

IPC分类号： G06Q50/22 ,  G06F19/00

CPC分类号： G06F19/34 ,  G06Q50/22

摘要： An infection spread prevention support system includes an examination terminal and an infection spread prevention support server. The examination terminal includes an examination information acquisition unit that acquires examination information to examine the infection of an infectious disease in subjects and a transmission and reception unit that transmits the examination information to the infection spread prevention support server. The infection spread prevention support server includes a receiving unit that receives examination information, an infection determination unit that determines the presence or degree of infection of the infectious disease using the examination information, an activity regulation information generation unit that generates activity regulation information to regulate the an activity of the infected patient based on infection determination information, which is a determination result of the infection determination unit, and information regarding the subjects, and an output unit that outputs the activity regulation information.

公开(公告)号：EP1641028A4

公开(公告)日：2008-10-15

申请号：EP04746086

申请日：2004-06-11

申请人： NIPPON KOGAKU KK

发明人： OWA SOICHI ,  MAGOME NOBUTAKA ,  HIRUKAWA SHIGERU ,  KUDO YOSHIHIKO ,  INOUE JIRO ,  KOHNO HIROTAKA ,  NEI MASAHIRO ,  IMAI MOTOKATSU ,  NAGASAKA HIROYUKI ,  SHIRAISHI KENICHI ,  NISHII YASUFUMI ,  TAKAIWA HIROAKI

IPC分类号： H01L21/027 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： In exposing substrate P by projecting an image of a pattern onto substrate P via projection optical system PL and liquid 1, side surface PB and underside surface PC of substrate P are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.

公开(公告)号：EP1571695A4

公开(公告)日：2008-10-15

申请号：EP03777347

申请日：2003-12-08

申请人： NIPPON KOGAKU KK

发明人： NEI MASAHIRO ,  KOBAYASHI NAOYUKI ,  ARAI DAI ,  OWA SOICHI

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/707 ,  G03F7/70341

摘要： An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.

公开(公告)号：EP1571696A4

公开(公告)日：2008-03-26

申请号：EP03777348

申请日：2003-12-08

申请人： NIPPON KOGAKU KK

发明人： NEI MASAHIRO ,  KOBAYASHI NAOYUKI ,  CHIBA HIROSHI ,  HIRUKAWA SHIGERU

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7026 ,  G03F7/70341 ,  G03F9/7003 ,  G03F9/7034

摘要： An exposure apparatus EX performs exposure for a substrate P by filling a space between a projection optical system PL and the substrate P with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 by using the projection optical system PL. The exposure apparatus EX includes a substrate stage PST for holding the substrate P, a liquid supply unit 1 for supplying the liquid 50 to a side of an image plane of the projection optical system PL, and a focus/leveling-detecting system 14 for detecting surface information about a surface of the substrate P not through the liquid 50. The exposure apparatus EX performs liquid immersion exposure for the substrate P while adjusting a positional relationship between the surface of the substrate P and the image plane formed through the projection optical system PL and the liquid 50, on the basis of the surface information detected by the focus/leveling-detecting system 14. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

公开(公告)号：EP1009020A4

公开(公告)日：2005-05-04

申请号：EP98933930

申请日：1998-07-24

申请人： NIPPON KOGAKU KK

发明人： NEI MASAHIRO ,  OGATA TARO

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70241 ,  G03F7/70941

摘要： A photosensitive wafer is exposed to light of a target illuminance regardless of the variation of time-varying transmittance of an optical system as follows. 20,000 pulses are idly shot before starting exposure of a first wafer (25). At the time of the first and 20,000th pulse laser oscillations, the transmittances of the optical system are calculated at the two moments by acquiring the output signals from an integrator sensor (10) and an illuminance sensor (28), and then a predictive line of time-varying transmittance is calculated from the two transmittances. When the exposure is started, the transmittance of the optical system is calculated at the elapsed time of exposure from the predictive line of time-varying transmittance, and the intensity of exposing light is controlled. The illuminance on the wafer can be compensated for depending on the actual variation of the transmittance. The accumulated quantity of exposing light incident to the wafer (25) is regulated to ensure a target exposure dose of the wafer (25) regardless of the variation in the transmittance of an illumination optical system or a projection optical system during exposure.

公开(公告)号：EP1039511A4

公开(公告)日：2005-03-02

申请号：EP98959158

申请日：1998-12-10

申请人： NIPPON KOGAKU KK

发明人： HIRUKAWA SHIGERU ,  SUWA KYOICHI ,  MURAKAMI SEIRO ,  NEI MASAHIRO

IPC分类号： G03F7/20 ,  H01L21/027

CPC分类号： G03F7/70058 ,  G03F7/70358 ,  G03F7/70475

摘要： A projection alignment apparatus in which a rectangular illumination region (21R) on a reticle (R) is illuminated with exposure light from an exposure light source (1), and while a pattern in the illuminated region (21R) is projected through a projection optical system (PL) onto a rectangular exposure region (21W) on a wafer (W), the reticle (R) and the wafer (W) are synchronously scanned relative to the projection optical system (PL) to transfer the pattern image of the reticle (R) onto a shot region on the wafer (W). The projection magnification of the projection optical system (PL) is set within a range of 1/5 to 1/10, and a reticle is used which is larger than, for instance, a 6 inch square (approximately 152 mm square).