公开(公告)号：EP1756663A4

公开(公告)日：2009-08-12

申请号：EP04814940

申请日：2004-12-20

申请人： NIPPON KOGAKU KK

发明人： WATSON DOUGLAS C ,  NOVAK W THOMAS

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/70258 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/709

摘要： An immersion lithography system that compensating for any displacement of the optical caused by the immersion fluid. The system includes an optical assembly (14) to project an image defined by the reticle (12) onto the wafer (20). The optical assembly includes a final optical element (16) spaced from the wafer by a gap (24). An immersion element (22) is provided to supply an immersion fluid into the gap and to recover any immersion fluid that escapes the gap. A fluid compensation system is provided for the force on the final optical element of the optical assembly caused by pressure variations of the immersion fluid. The resulting force created by the varying pressure may cause final optical element to become displaced. The fluid compensation system is configured to provide a substantially equal, but opposite force on the optical assembly, to prevent the displacement of the final optical element.

公开(公告)号：EP1614000A4

公开(公告)日：2007-05-09

申请号：EP04759834

申请日：2004-04-12

申请人： NIPPON KOGAKU KK

发明人： NOVAK W THOMAS

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70258 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70641 ,  G03F7/70958 ,  G03F9/7026 ,  G03F9/7034

摘要： An autofocus unit is provided to an immersion lithography apparatus in which a fluid is disposed over a target surface of a workpiece and an image pattern is projected onto this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position that is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam.

摘要翻译： 光刻投影装置包括具有最后元件的投影系统，通过该投影系统，曝光光通过局部覆盖晶片的上表面的一部分的液体投射到晶片的上表面。 最后一个元件具有从其发射曝光光的下表面。 最后一个元件还具有从下表面的边缘部分向上延伸的外表面。 该装置还包括沿着最后一个元件的外表面的空间，液体从最后一个元件的下表面的上方供应到该空间。 该空间由最后一个元件的外表面和与最后一个元件的外表面相对的表面限定。

公开(公告)号：EP1614001A4

公开(公告)日：2007-05-16

申请号：EP04759103

申请日：2004-04-02

申请人： NIPPON KOGAKU KK

发明人： HAZELTON ANDREW J ,  KAWAI HIDEMI ,  WATSON DOUGLAS C ,  NOVAK W THOMAS

IPC分类号： G03B27/42 ,  B08B3/04 ,  B08B3/12 ,  G03F7/20

CPC分类号： G03F7/70341 ,  B08B3/04 ,  B08B3/12 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70925

摘要： An immersion lithography apparatus (100) has a reticle stage (RST) arranged to retain a reticle (R), a working stage (9-11) arranged to retain a workpiece (W), and an optical system including an illumination source and an optical element (4) opposite the workpiece (W) for having an image pattern of the reticle (R) projected by radiation from the illumination source. A gap is defined between the optical element (4) and the workpiece (W), and a fluid-supplying device (5) serves to supply an immersion liquid (7) into this gap such that the supplied immersion liquid (7) contacts both the optical element (4) and the workpiece (W) during an immersion lithography process. A cleaning device (30) is incorporated for removing absorbed liquid from the optical element (4) during a cleanup process. The cleaning device (30) may make use of a cleaning liquid having affinity to the absorbed liquid, heat, a vacuum condition, ultrasonic vibrations or cavitating bubbles for the removal of the absorbed liquid. The cleaning liquid may be supplied through the same fluid-applying device provided with a switching device such as a valve.

摘要翻译： 浸没式光刻设备（100）具有布置成保持掩模版（R），布置成保持工件（W）的工作台（9-11）的掩模版台（RST）和包括照明源和 光学元件（4），其与工件（W）相对，用于具有通过来自照明源的辐射而突出的标线（R）的图像图案。 在光学元件（4）和工件（W）之间限定间隙，并且流体供应装置（5）用于将浸没液体（7）供应到该间隙中，使得所提供的浸液（7）接触两者 光学元件（4）和工件（W）。 一种清洁装置（30），用于在净化过程中从光学元件（4）中去除吸收的液体。 清洁装置（30）可以利用对被吸收的液体，热，真空条件，超声波振动或气蚀气泡具有亲和性的清洁液体，以除去吸收的液体。 可以通过设置有诸如阀门的开关装置的相同的流体施加装置来供应清洁液体。

公开(公告)号：EP1446698A4

公开(公告)日：2004-10-20

申请号：EP02752756

申请日：2002-08-07

申请人： NIPPON KOGAKU KK

发明人： NOVAK W THOMAS ,  STUMBO DAVID ,  INOUE FUYUHIKO

IPC分类号： G01B11/00 ,  G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G01B11/02 ,  G03B27/32 ,  G03B27/52 ,  G03B27/54 ,  G03F5/00 ,  G03F9/00

CPC分类号： G03F7/70775 ,  G01B9/02068 ,  G01B9/0207 ,  G01B9/02076

摘要： An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.