摘要:
A SAW (surface acoustic wave) device includes a substrate having thereon at least one apodized IDT (inter-digital transducer) (10). The axis (18) of the apodization pattern is inclined towards a driven conductive rail (14) of the IDT at the ends of the pattern, whereby the driven end fingers have a low capacitive coupling to a ground plane on which the substrate is supported. The capacitive coupling to the ground plane may additionally be reduced by supporting the substrate on the ground plane via an insulating support, whereby an air gap or the insulating support decreases the capacitance between the IDT and the ground plane.
摘要:
A SAW (surface acoustic wave) device includes a substrate having thereon at least one apodized IDT (inter-digital transducer) (10). The axis (18) of the apodization pattern is inclined towards a driven conductive rail (14) of the IDT at the ends of the pattern, whereby the driven end fingers have a low capacitive coupling to a ground plane on which the substrate is supported. The capacitive coupling to the ground plane may additionally be reduced by supporting the substrate on the ground plane via an insulating support, whereby an air gap or the insulating support decreases the capacitance between the IDT and the ground plane.
摘要:
Each IDT (inter-digital transducer) (22, 24) of a SAW (surface acoustic wave) device (20) is formed on a thin resistive doped silicon film having the same pattern as the IDT, which improves adhesion of the IDT to the substrate. The silicon film also constitutes electro-acoustic absorbers (26, 28) between the IDTs and edges (40, 42) of the substrate, and can have a linearly tapered edge adjacent to each IDT to suppress reflections at the absorber boundary. The SAW device is formed by sputtering silicon onto the substrate, subsequently forming the IDTs, and then etching the silicon from areas where it is not wanted.
摘要:
A SAW (surface acoustic wave) device includes a substrate having thereon at least one apodized IDT (inter-digital transducer) (10). The axis (18) of the apodization pattern is inclined towards a driven conductive rail (14) of the IDT at the ends of the pattern, whereby the driven end fingers have a low capacitive coupling to a ground plane on which the substrate is supported. The capacitive coupling to the ground plane may additionally be reduced by supporting the substrate on the ground plane via an insulating support, whereby an air gap or the insulating support decreases the capacitance between the IDT and the ground plane.
摘要:
57 Each IDT (inter-digital transducer) (12, 14) of a SAW (surface acoustic wave) device has a linearly tapered back edge formed by reflection-suppressing fingers (18, 26) of successively decreasing length spaced apart with a pitch of lambda/4 behind the active region (16, 24) of the IDT, where lambda is the wavelength of a SAW to be propagated, whereby [ SAW reflections at the back edge of the IDT are substantially eliminated. A thin resistive doped sili- r con film (40, 42) between the back edge of each IDT and the adjacent edge (36, 38) of the substrate absorbs waves propagated via this back edge. The film underlies the IDTs to provide improved adhesion to the substrate.
摘要:
Each IDT (inter-digital transducer) (22, 24) of a SAW (surface acoustic wave) device (20) is formed on a thin resistive doped silicon film having the same pattern as the IDT, which improves adhesion of the IDT to the substrate. The silicon film also constitutes electro-acoustic absorbers (26, 28) between the IDTs and edges (40, 42) of the substrate, and can have a linearly tapered edge adjacent to each IDT to suppress reflections at the absorber boundary. The SAW device is formed by sputtering silicon onto the substrate, subsequently forming the IDTs, and then etching the silicon from areas where it is not wanted.
摘要:
57 Each IDT (inter-digital transducer) (12, 14) of a SAW (surface acoustic wave) device has a linearly tapered back edge formed by reflection-suppressing fingers (18, 26) of successively decreasing length spaced apart with a pitch of lambda/4 behind the active region (16, 24) of the IDT, where lambda is the wavelength of a SAW to be propagated, whereby [ SAW reflections at the back edge of the IDT are substantially eliminated. A thin resistive doped sili- r con film (40, 42) between the back edge of each IDT and the adjacent edge (36, 38) of the substrate absorbs waves propagated via this back edge. The film underlies the IDTs to provide improved adhesion to the substrate.