专利检索 ap:("NTT AFTY Corporation") AND inv:"NOZAKI, Toshiyuki, c/o NTT AFTY CORPORATION" 第 1 页

1.

发明公开
ECR PLASMA SOURCE AND ECR PLASMA DEVICE 有权
标题翻译： ECR-PLASMAQUELLE UND ECR-PLASMAEINRICHTUNG

公开(公告)号：EP1494512A1

公开(公告)日：2005-01-05

申请号：EP03745980.7

申请日：2003-04-09

申请人： NTT AFTY Corporation

发明人： MATSUO, Seitaro, c/o NTT AFTY CORPORATION , NOZAKI, Toshiyuki, c/o NTT AFTY CORPORATION , TANAKA, Fumio, c/o NTT AFTY CORPORATION

IPC分类号： H05H1/46 , H01L21/3065 , H01L21/205 , C23C14/22 , C23C16/511

CPC分类号： H01J37/32229 , H01J37/32192 , H01J37/32247 , H01J37/32357 , H01J37/32678 , H05H1/18 , H05H1/46

摘要： An ECR plasma source of the invention is constructed of: a plasma generating chamber (10) having a generally rectangular section in a plane normal to a plasma flow; magnetic coils (20, 21) wound in generally rectangular shapes in a plane normal to the plasma flow; and a direct introduction type or branching and binding introduction type waveguide (30) or microwave cavity resonator. Microwaves are transmitted into the plasma generating chamber (10) from a plurality of openings (34) which are formed in such side faces in the waveguide (30) or the microwave cavity resonator as correspond to in-phase microwave portions. Moreover, an ECR plasma device comprises the aforementioned ECR plasma source and a sample moving mechanism for moving a large-sized sample.