公开(公告)号：EP2007844A2

公开(公告)日：2008-12-31

申请号：EP07753146.5

申请日：2007-03-14

申请人： Nanogram Corporation

发明人： CHIRUVOLU, Shivkumar ,  LI, Weidong ,  ALTMAN, Igor ,  DU, Hui, K. ,  KAMBE, Nobuyuki ,  MOSSO, Ronald, J.

IPC分类号： C09K11/08

CPC分类号： C09K11/7774 ,  B82Y30/00 ,  C01F17/0025 ,  C01P2002/04 ,  C01P2002/52 ,  C01P2002/72 ,  C01P2004/03 ,  C01P2004/50 ,  C01P2004/64

摘要： Collections of phosphor particles have achieved improved performance based on improved material properties, such as crystallinity. Display devices can be formed with these improved submicron phosphor particles. Improved processing methods contribute to the improved phosphor particles, which can have high crystallinity and a high degree of particle size uniformity. Dispersions and composites can be effectively formed from the powders of the submicron particle collections.

公开(公告)号：EP3097975A1

公开(公告)日：2016-11-30

申请号：EP16179437.5

申请日：2011-06-28

申请人： Nanogram Corporation

发明人： CHIRUVOLU, Shivkumar ,  ALTMAN, Igor ,  FREY, Bernard M. ,  LI, Weidong ,  LIU, Guojun ,  LYNCH, Robert B. ,  PENGRA-LEUNG, Gina Elizabeth ,  SRINIVASAN, Uma

IPC分类号： B01J13/00 ,  C01B33/02 ,  C01G17/00 ,  C09D11/00 ,  B01J19/08 ,  H01L31/00 ,  C09D11/037 ,  C09D11/322

CPC分类号： C09D11/38 ,  B01D21/262 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0875 ,  B82Y30/00 ,  C01B33/02 ,  C08K3/08 ,  C08K3/36 ,  C08K9/02 ,  C09D5/24 ,  C09D7/67 ,  C09D7/68 ,  C09D7/80 ,  C09D11/037 ,  C09D11/101 ,  C09D11/322 ,  C09D11/36 ,  C09D11/52 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02579 ,  H01L21/02581 ,  H01L21/02601 ,  H01L21/02628 ,  H01L23/4828 ,  H01L23/53276 ,  H01L31/00 ,  H01L31/02363 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/0747 ,  H01L31/182 ,  H01L31/1864 ,  H01L2924/0002 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  H01L2924/00

摘要： Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.

摘要翻译： 激光热解的反应器设计和反应物对应的入口喷嘴的描述，以提供所期望的颗粒淬火做特别适用于单质硅颗粒的合成。 特别地，喷嘴可以有一个设计来鼓励成核和淬火与基于围绕所述反应物前体流量的惰性气体的流量显著并用有效围绕所述反应物前体的大的惰性夹带流动的惰性气体和骤冷气体流动。 改进的硅纳米颗粒油墨记载那样具有硅纳米粒子，而不与有机化合物的任何表面改性。 硅油墨性能可被改造为特殊印刷应用，颜色：如喷墨印刷，照相凹版印刷或丝网印刷。 适当的处理方法被描述而不表面改性的硅纳米粒子，以提供墨水的设计灵活性。

公开(公告)号：EP2588227A2

公开(公告)日：2013-05-08

申请号：EP11804119.3

申请日：2011-06-28

申请人： Nanogram Corporation

发明人： CHIRUVOLU, Shivkumar ,  ALTMAN, Igor ,  FREY, Bernard, M. ,  LI, Weidong ,  LIU, Guojun ,  LYNCH, Robert, B. ,  PENGRA-LEUNG, Gina, Elizabeth ,  SRINIVASAN, Uma

IPC分类号： B01J13/00 ,  C01B33/02 ,  C01G17/00 ,  C09D11/00 ,  B01J19/08

CPC分类号： C09D11/38 ,  B01D21/262 ,  B01J19/121 ,  B01J2219/0869 ,  B01J2219/0871 ,  B01J2219/0875 ,  B82Y30/00 ,  C01B33/02 ,  C08K3/08 ,  C08K3/36 ,  C08K9/02 ,  C09D5/24 ,  C09D7/67 ,  C09D7/68 ,  C09D7/80 ,  C09D11/037 ,  C09D11/101 ,  C09D11/322 ,  C09D11/36 ,  C09D11/52 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02579 ,  H01L21/02581 ,  H01L21/02601 ,  H01L21/02628 ,  H01L23/4828 ,  H01L23/53276 ,  H01L31/00 ,  H01L31/02363 ,  H01L31/03682 ,  H01L31/03762 ,  H01L31/0747 ,  H01L31/182 ,  H01L31/1864 ,  H01L2924/0002 ,  Y02E10/52 ,  Y02E10/546 ,  Y02E10/548 ,  Y02P70/521 ,  H01L2924/00

摘要： Laser pyrolysis reactor designs and corresponding reactant inlet nozzles are described to provide desirable particle quenching that is particularly suitable for the synthesis of elemental silicon particles. In particular, the nozzles can have a design to encourage nucleation and quenching with inert gas based on a significant flow of inert gas surrounding the reactant precursor flow and with a large inert entrainment flow effectively surrounding the reactant precursor and quench gas flows. Improved silicon nanoparticle inks are described that has silicon nanoparticles without any surface modification with organic compounds. The silicon ink properties can be engineered for particular printing applications, such as inkjet printing, gravure printing or screen printing. Appropriate processing methods are described to provide flexibility for ink designs without surface modifying the silicon nanoparticles.