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公开(公告)号:EP1583190B1
公开(公告)日:2008-12-24
申请号:EP05252041.8
申请日:2005-03-31
申请人: Nichia Corporation
CPC分类号: B82Y20/00 , H01S5/0202 , H01S5/026 , H01S5/028 , H01S5/0425 , H01S5/1082 , H01S5/2009 , H01S5/2201 , H01S5/2214 , H01S5/2231 , H01S5/305 , H01S5/3054 , H01S5/3202 , H01S5/34333 , H01S2304/04 , H01S2304/12
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公开(公告)号:EP1583190A1
公开(公告)日:2005-10-05
申请号:EP05252041.8
申请日:2005-03-31
申请人: Nichia Corporation
CPC分类号: B82Y20/00 , H01S5/0202 , H01S5/026 , H01S5/028 , H01S5/0425 , H01S5/1082 , H01S5/2009 , H01S5/2201 , H01S5/2214 , H01S5/2231 , H01S5/305 , H01S5/3054 , H01S5/3202 , H01S5/34333 , H01S2304/04 , H01S2304/12
摘要: A nitride semiconductor laser device comprises, on a principle face of a nitride semiconductor substrate: a nitride semiconductor layer having a first conductivity type; an active layer comprising indium, and a nitride semiconductor layer having a second conductivity type that is different from said first conductivity type, and on the surface of which is formed a stripe ridge; said principal face of said nitride semiconductor substrate having an off angle a (θ a ) with respect to a reference crystal plane, in at least a direction substantially parallel to said stripe ridge.
摘要翻译: 氮化物半导体激光装置在氮化物半导体衬底的(0001)的第一原理面上包括具有第一导电类型的氮化物半导体层,有源层和具有不同的第二导电类型的氮化物半导体层 从第一导电类型,并且在其表面上形成条纹脊。 (000-1)面和除了(000-1)面以外的倾斜面露出在氮化物半导体衬底的第二主面上。 除了(000-1)面以外的倾斜面在第二主面的表面积以上不小于0.5%。
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