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公开(公告)号：EP3196330A1
公开(公告)日：2017-07-26
申请号：EP14902022.4
申请日：2014-09-17
发明人： MORIGUCHI, Hideki , SAITO, Tadashi , TANAKA, Yoshikazu , ARAHI, Tetsumi , OGAWA, Katsuaki , OKAZAKI, Takahiro , SUGIURA, Hiroyuki , ITO, Yoshihiro
CPC分类号： C23C14/0605 , B82Y40/00 , C01B31/0206 , C01B32/05 , C23C14/024 , C23C14/06 , C23C14/5833
摘要： Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance (defect resistance) and peeling resistance. This coating film coats a substrate surface, wherein a hard carbon layer is formed extending in columns-shape perpendicular to the substrate when observed in a cross-sectional bright-field TEM image, the hard carbon layer is formed using a PVD method, and the ID/IG ratio is 1-6 when the hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature to maintain a substrate temperature of 250-400°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.
摘要翻译： 本发明提供不仅充分提高低摩擦性和耐磨耗性的平衡，而且耐崩裂性（耐缺损性）和耐剥离性提高的涂膜及其制造方法和PVD装置。 该涂膜覆盖基板表面，其中当在横截面明视场TEM图像中观察时，形成垂直于基板的柱状延伸的硬碳层，硬质碳层使用PVD法形成，并且 当使用拉曼光谱测量硬碳层时，ID / IG比为1-6，所述比率是拉曼光谱D谱带峰面积强度与G谱带峰面积强度之比。 涂膜制造方法和装置使用电弧PVD法，并且在控制偏压，电弧电流和加热器温度以将衬底温度维持在250-400℃的同时，还用硬碳膜涂覆衬底表面 旋转和/或旋转衬底。
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公开(公告)号：EP3196331A1
公开(公告)日：2017-07-26
申请号：EP14902110.7
申请日：2014-09-17
发明人： MORIGUCHI, Hideki , SAITO, Tadashi , TANAKA, Yoshikazu , SHIBATA, Akinori , ARAHI, Tetsumi , OGAWA, Katsuaki , OKAZAKI, Takahiro , SUGIURA, Hiroyuki , ITO, Yoshihiro
CPC分类号： C10M103/02 , C01B31/02 , C01B32/05 , C01P2002/82 , C01P2004/04 , C10M2201/0413 , C10N2230/20 , C23C14/06 , C23C14/0605 , C23C14/325
摘要： Provided are a coating film, a manufacturing method for the same, and a PVD device that not only sufficiently improve the balance of low-friction properties and wear resistance, but also improve chipping resistance and peeling resistance. This film is coated on a substrate surface, wherein the coating film has a hard carbon that presents relatively black and white when observed in a cross-sectional bright-field TEM image, a mesh-shaped hard carbon layer is formed using a PVD method, said layer having white-colored hard carbon in a mesh shape extending in the thickness direction and black-colored hard carbon dispersed into the cavities in the mesh, and the ID/IG ratio is 1-6 when the mesh-shaped hard carbon layer is measured using Raman spectroscopy, said ratio being the ratio of the Raman spectrum D band peak area intensity and G band peak area intensity. The coating film manufacturing method and the device use an arc PVD method, and while controlling the bias voltage, arc current, and heater temperature, etc. to maintain a substrate temperature exceeding 200°C but not exceeding 300°C, also coat the substrate surface with the hard carbon film by rotating and/or revolving the substrate.
摘要翻译： 本发明提供不仅充分提高低摩擦性和耐磨损性的平衡，而且耐崩裂性和耐剥离性提高的涂膜，其制造方法以及PVD装置。 该膜被涂布在基板表面上，其中该涂膜具有在横截面明视场TEM图像中观察时呈现相对黑色和白色的硬碳，使用PVD法形成网状硬碳层， 所述层具有在厚度方向上延伸的网状形状的白色硬碳和分散在网状物内的空腔中的黑色硬碳，并且当网状硬碳层为网状时，ID / IG比为1-6 使用拉曼光谱法测量，所述比率是拉曼光谱D谱带峰面积强度与G谱带峰面积强度之比。 涂膜制造方法和装置使用电弧PVD方法，并且在控制偏压，电弧电流和加热器温度等的同时将衬底温度维持超过200℃但不超过300℃，同时涂覆衬底 通过旋转和/或旋转衬底而与硬质碳膜表面接触。
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