摘要:
The present invention provides a positive type resist composition which has excellent photosensitivity in light decomposition. The composition comprises;
(a) a polymer having at least 70 % of isotactic construction, prepared from polymerizable monomers, at least a portion of which is a (meth)acrylate monomer having a group selected from the class consisting of a t-butyl group, a benzyl group, an alpha-methylbenzyl group, an alpha, alpha-dimethylbenzyl group and a trityl group, and (b) a photoactivator which generates an acid in response to a light irradiation.
The present invention also provides a resist composition into which, instead of the polymer (a), a polymer (c) is formulated which has at least 70 % of isotactic construction and is prepared from polymerizable monomers, at least a portion of which is a hydroxyl styrene selected from the class consisting of p-t-butoxycarbonyloxystyrene, p-t-butoxycarbonyloxy-alpha-methyl-styrene, t-butyl-p-vinyl benzoate and t-butyl-p-isopropenylphenyloxy acetate.
摘要:
Disclosed is a polymer prepared from an α,β-ethylenic unsaturated compound, characterized by having a structure represented by the following general formula (1):
(where, R¹ and R², which are the same or different, represent a C1 - C4 alkyl group, m is an integer of 1 - 10 and n is 0, 1 or 2) in the molecule.