Resist composition
    1.
    发明公开
    Resist composition 失效
    Resistzusammensetzung。

    公开(公告)号:EP0484021A1

    公开(公告)日:1992-05-06

    申请号:EP91309659.0

    申请日:1991-10-18

    CPC分类号: G03F7/039 G03F7/075

    摘要: The present invention provides a positive type resist composition which has excellent photosensitivity in light decomposition. The composition comprises;

    (a) a polymer having at least 70 % of isotactic construction, prepared from polymerizable monomers, at least a portion of which is a (meth)acrylate monomer having a group selected from the class consisting of a t-butyl group, a benzyl group, an alpha-methylbenzyl group, an alpha, alpha-dimethylbenzyl group and a trityl group, and
    (b) a photoactivator which generates an acid in response to a light irradiation.

    The present invention also provides a resist composition into which, instead of the polymer (a), a polymer (c) is formulated which has at least 70 % of isotactic construction and is prepared from polymerizable monomers, at least a portion of which is a hydroxyl styrene selected from the class consisting of p-t-butoxycarbonyloxystyrene, p-t-butoxycarbonyloxy-alpha-methyl-styrene, t-butyl-p-vinyl benzoate and t-butyl-p-isopropenylphenyloxy acetate.

    摘要翻译: 本发明提供一种在光分解中具有优异的光敏性的正型抗蚀剂组合物。 组合物包含 (a)由可聚合单体制备的具有至少70%全同立构构型的聚合物,其至少一部分是(甲基)丙烯酸酯单体,其具有选自叔丁基,苄基 ,α-甲基苄基,α,α-二甲基苄基和三苯甲基,和(b)响应于光照射而产生酸的光活化剂。 本发明还提供一种抗蚀剂组合物,代替聚合物(a),配制聚合物(c),其具有至少70%的全同立构构型,并由可聚合单体制备,其中至少一部分为 选自对叔丁氧羰基氧基苯乙烯,对叔丁氧羰基氧基-α-甲基苯乙烯,叔丁基对乙烯基苯甲酸酯和叔丁基对异丙烯基苯氧基乙酸酯的羟基苯乙烯。